Mutilayer electronic component

ABSTRACT

A multilayer electronic component includes a body and first and second surfaces opposing each other in a first direction, third and fourth surfaces connected to the first and second surfaces and opposing each other in a second direction; a first external electrode including a first connection portion disposed on the third surface, and a first band portion extending from the first connection portion to a portion of the first surface; a second external electrode including a second connection portion disposed on the fourth surface, and a second band portion extending from the second connection portion to a portion of the first surface; an insulating layer disposed on the second surface and extending to the first and second connection portions; a first plating layer disposed on the first band portion; and a second plating layer disposed on the second band portion, wherein the insulating layer includes an oxide including silicon (Si).

CROSS-REFERENCE TO RELATED APPLICATION(S)

This application claims benefit of priority to Korean Patent Application No. 10-2021-0193707 filed on Dec. 31, 2021 in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference in its entirety.

TECHNICAL FIELD

The present disclosure relates to a multilayer electronic component.

A multilayer ceramic capacitor (MLCC), a multilayer electronic component, may be a chip-type capacitor mounted on the printed circuit boards of various electronic products including an imaging device such as a liquid crystal display (LCD) and a plasma display panel (PDP), a computer, or the like, smartphones and mobile phones, and may charge or discharge electricity.

Such a multilayer ceramic capacitor may be used as a component of various electronic devices as a multilayer ceramic capacitor may have a relatively small size and high capacitance and may be easily mounted.

Recently, with the miniaturization and multifunctionalization of electronic products, the demand for high integration density and high capacity of a multilayer ceramic capacitor has increased, such that a space between the multilayer ceramic capacitors has been reduced.

Also, as multilayer ceramic capacitors have been used in automobiles or infotainment systems, demand for high reliability, high strength properties and miniaturization have increased.

For miniaturization and high capacitance of the multilayer ceramic capacitor, it may be necessary to increase the number of laminated layers by reducing thicknesses of internal electrodes and dielectric layers, and by reducing the volume of the portion not affecting capacitance formation, an effective volume fraction required to implement capacitance may need to be increased.

Also, it may be necessary to reduce a mounting space to mount a greater number of components within a limited area of a substrate.

Also, as a thickness of a margin decreases with miniaturization and high capacitance of a multilayer ceramic capacitor, external moisture and a plating solution may easily permeate, and accordingly, reliability may degrade. Accordingly, a method for protecting a multilayer ceramic capacitor from permeation of external moisture or a plating solution may be necessary.

SUMMARY

An aspect of the present disclosure is to address the issue in which, when a glass layer surrounding a multilayer electronic component is formed to protect the multilayer electronic component from thermal expansion and thermal reduction, aggregation may occur in the glass layer such that it may be difficult to form a uniform film.

An aspect of the present disclosure is to address the issue in which hardness of a glass layer may increase at a temperature below a softening point, and stress may be transferred to the multilayer electronic component, causing cracks and delamination in the multilayer electronic component.

An aspect of the present disclosure is to address the issue in which, in a process of raising temperature, a metal of an external electrode included in the multilayer electronic component diffuses to an internal electrode and radiation cracks are created.

According to an aspect of the present disclosure, a multilayer electronic component includes a body including a dielectric layer and first and second internal electrodes alternately disposed with the dielectric layer interposed therebetween, and including first and second surfaces opposing each other in a first direction, third and fourth surfaces connected to the first and second surfaces and opposing each other in a second direction, and fifth and sixth surfaces connected to the first to fourth surfaces and opposing each other a third direction; a first external electrode including a first connection portion disposed on the third surface, and a first band portion extending from the first connection portion to a portion of the first surface; a second external electrode including a second connection portion disposed on the fourth surface, and a second band portion extending from the second connection portion to a portion of the first surface; an insulating layer disposed on the second surface and extending to the first and second connection portions; a first plating layer disposed on the first band portion; and a second plating layer disposed on the second band portion, wherein the insulating layer includes an oxide including silicon (Si).

According to another aspect of the present disclosure, a multilayer electronic component includes a body including a dielectric layer and first and second internal electrodes alternately disposed with the dielectric layer interposed therebetween, and including first and second surfaces opposing each other in a first direction, third and fourth surfaces connected to the first and second surfaces and opposing each other in a second direction, and fifth and sixth surfaces connected to the first to fourth surfaces and opposing each other a third direction; a first external electrode including a first connection portion disposed on the third surface and a first band portion extending from the first connection portion to a portion of the first surface; a second external electrode including a second connection portion disposed on the fourth surface and a second band portion extending from the second connection portion to a portion of the first surface; an insulating layer disposed on the second surface and extending to the first and second connection portions; a first plating layer disposed on the first band portion; and a second plating layer disposed on the second band portion, wherein the insulating layer includes at least one of an oxide including boron (B), borosilicate, and zinc-borosilicate.

According to another aspect of the present disclosure, a multilayer electronic component includes a body including a dielectric layer and first and second internal electrodes alternately disposed with the dielectric layer interposed therebetween, and including first and second surfaces opposing each other in a first direction, third and fourth surfaces connected to the first and second surfaces and opposing each other in a second direction, and fifth and sixth surfaces connected to the first to fourth surfaces and opposing each other a third direction; a first external electrode including a first connection portion disposed on the third surface, a first band portion extending from the first connection portion to a portion of the first surface, and a third band portion extending from the first connection portion to a portion of the second surface; a second external electrode including a second connection portion disposed on the fourth surface, a second band portion extending from the second connection portion to a portion of the first surface, and a fourth band portion extending from the second connection portion to a portion of the second surface; an insulating layer disposed on the first and second connection portions and covering the second surface and the third and fourth band portions; a first plating layer disposed on the first band portion; and a second plating layer disposed on the second band portion, wherein the insulating layer includes an oxide including silicon (Si).

According to another aspect of the present disclosure, a multilayer electronic component includes a body including a dielectric layer and first and second internal electrodes alternately disposed with the dielectric layer interposed therebetween, and including first and second surfaces opposing each other in a first direction, third and fourth surfaces connected to the first and second surfaces and opposing each other in a second direction, and fifth and sixth surfaces connected to the first to fourth surfaces and opposing each other a third direction; a first external electrode including a first connection portion disposed on the third surface, a first band portion extending from the first connection portion to a portion of the first surface, and a first corner portion extending from the first connection portion to a corner connecting the second surface to the third surface; a second external electrode including a second connection portion disposed on the fourth surface, a second band portion extending from the second connection portion to a portion of the first surface, and a second corner portion extending from the second connection portion to a corner connecting the second surface to the fourth surface; an insulating layer disposed on the first and second connection portions and disposed to cover the second surface and the first and second corner portions; a first plating layer disposed on the first band portion; and a second plating layer disposed on the second band portion, wherein, when an average distance in the second direction from an extension line of the third surface to an end of the first corner is defined as B3, an average distance in the second direction from an extension line of the fourth surface to an end of the second corner portion is defined as B4, an average size of a region in which the third surface and the second internal electrode are spaced apart from each other, taken in the second direction, is defined as G1, and an average size of a region in which the fourth surface and the first internal electrode are spaced apart from each other, taken in the second direction, is defined as G2, B3≤G1 and B4≤G2 are satisfied, and wherein the insulating layer includes an oxide including silicon (Si).

According to another aspect of the present disclosure, a multilayer electronic component includes a body including a dielectric layer and first and second internal electrodes alternately disposed with the dielectric layer interposed therebetween, and including first and second surfaces opposing each other in a first direction, third and fourth surfaces connected to the first and second surfaces and opposing each other in a second direction, and fifth and sixth surfaces connected to the first to fourth surfaces and opposing each other a third direction; a first external electrode including a first connection electrode disposed on the third surface and a first band electrode disposed on the first surface and connected to the first connection electrode; a second external electrode including a second connection electrode disposed on the fourth surface and a second band electrode disposed on the first surface and connected to the second connection electrode; a first insulating layer disposed on the first connection electrode; a second insulating layer disposed on the second connection electrode; a first plating layer disposed on the first band electrode; and a second plating layer disposed on the second band electrode, wherein the insulating layer includes an oxide including silicon (Si).

BRIEF DESCRIPTION OF DRAWINGS

The above and other aspects, features, and advantages of the present disclosure will be more clearly understood from the following detailed description, taken in conjunction with the accompanying drawings, in which:

FIG. 1 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 2 is a perspective diagram illustrating a body of the multilayer electronic component in FIG. 1 ;

FIG. 3 is a cross-sectional diagram taken along line I-I′ in FIG. 1 ;

FIG. 4 is an exploded perspective diagram illustrating a body in FIG. 2 ;

FIG. 5 is a perspective diagram illustrating a substrate on which a multilayer electronic component in FIG. 1 is mounted;

FIG. 6 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 7 is a cross-sectional diagram taken along line II-II′ in FIG. 6 ;

FIG. 8 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 9 is a cross-sectional diagram taken along line III-III′ in FIG. 8 ;

FIG. 10 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 11 is a cross-sectional diagram taken along line IV-IV′ in FIG. 10 ;

FIG. 12 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 13 is a cross-sectional diagram taken along line V-V′ in FIG. 12 ;

FIG. 14 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 15 is a cross-sectional diagram taken along line VI-VI′ in FIG. 14 ;

FIG. 16 is a diagram illustrating a modified example of the example in FIG. 14 ;

FIG. 17 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 18 is a cross-sectional diagram taken along line VII-VII′ in FIG. 17 ;

FIG. 19 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 20 is a cross-sectional diagram taken along line VIII-VIII′ in FIG. 19 ;

FIG. 21 is a diagram illustrating a modified example of the example in FIG. 19 ;

FIG. 22 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 23 is a cross-sectional diagram taken along line IX-IX′ in FIG. 22 ;

FIG. 24 is a diagram illustrating a modified example of the example in FIG. 22 ;

FIG. 25 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 26 is a cross-sectional diagram taken along line X-X′ in FIG. 25 ;

FIG. 27 is a diagram illustrating a modified example of the example in FIG. 25 ;

FIG. 28 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 29 is a cross-sectional diagram taken along line XI-XI′ in FIG. 28 ;

FIG. 30 is a diagram illustrating a modified example of the example in FIG. 28 ;

FIG. 31 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 32 is a cross-sectional diagram taken along line XII-XII′ in FIG. 31 ;

FIG. 33 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 34 is a cross-sectional diagram taken along line XIII-XIII′ in FIG. 33 ;

FIG. 35 is a diagram illustrating a modified example of the example in FIG. 33 ;

FIG. 36 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment of the present disclosure;

FIG. 37 is a cross-sectional diagram taken along line XIV-XIV′ in FIG. 36 ; and

FIG. 38 is an enlarged diagram illustrating region K1 in FIG. 36 .

DETAILED DESCRIPTION

Hereinafter, embodiments of the present disclosure will be described as below with reference to the attached drawings.

The present disclosure may, however, be exemplified in many different forms and should not be construed as being limited to the specific embodiments set forth herein. Rather, these embodiments are provided such that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art. Accordingly, shapes and sizes of the elements in the drawings may be exaggerated for clarity of description. Also, elements having the same function within the scope of the same concept represented in the drawing of each example embodiment will be described using the same reference numeral.

In the drawings, same elements will be indicated by the same reference numerals. Also, redundant descriptions and detailed descriptions of known functions and elements that may unnecessarily make the gist of the present disclosure obscure will not be provided. In the accompanying drawings, some elements may be exaggerated, omitted or briefly illustrated, and the sizes of the elements do not necessarily reflect the actual sizes of these elements. Also, it will be understood that when a portion “includes” an element, it may further include another element, not excluding another element, unless otherwise indicated.

In the drawings, a first direction may be defined as a lamination direction or a thickness (T) direction, a second direction may be defined as a length (L) direction, and a third direction may be defined as a width (W) direction.

FIG. 1 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment.

FIG. 2 is a perspective diagram illustrating a body of the multilayer electronic component in FIG. 1 .

FIG. 3 is a cross-sectional diagram taken along line I-I′ in FIG. 1 .

FIG. 4 is an exploded perspective diagram illustrating a body in FIG. 2 .

FIG. 5 is a perspective diagram illustrating a substrate on which a multilayer electronic component in FIG. 1 is mounted.

Hereinafter, a multilayer electronic component 1000 in an example embodiment will be described with reference to FIGS. 1 to 5 .

The multilayer electronic component 1000 in an example embodiment may include a dielectric layer 111 and first and second internal electrodes 121 and 122 alternately disposed with the dielectric layer 111 interposed therebetween, and may further include a body 110 including first and second surfaces 1 and 2 opposing each other in the first direction, third and fourth surfaces 3 and 4 connected to the first and second surfaces 1 and 2 and opposing in the second direction, and fifth and sixth surfaces 5 and 6 connected to the first and second surfaces 1 and 2 and the third and fourth surfaces 3 and 4 and opposing each other in the third direction; a first external electrode including a first connection portion 131 a disposed on the third surface, a first band portion 131 b extending from the first connection portion to a portion of the first surface, and a third band portion 131 c extending from the first connection portion to a portion of the second surface; a second external electrode 132 including a second connection portion 132 a disposed on the fourth surface, a second band portion 132 b extending from the second connection portion to a portion of the first surface, and a fourth band portion 132 c extending from the second connection portion to a portion of the second surface; an insulating layer 151 disposed on the first and second connection portions and covering the second surface and the third and fourth band portions 131 c and 132 c; a first plating layer 141 disposed on the first band portion 131 b; and a second plating layer 142 disposed on the second band portion 132 b, and the insulating layer 151 may include an oxide including silicon (Si).

In the body 110, the dielectric layer 111 and the internal electrodes 121 and 122 may be alternately laminated.

The shape of the body 110 may not be limited to any particular shape, but as illustrated, the body 110 may have a hexahedral shape or a shape similar to a hexahedral shape. Due to reduction of ceramic powder included in the body 110 during a firing process, the body 110 may not have an exact hexahedral shape formed by linear lines but may have a substantially hexahedral shape.

The body 110 may have first and second surfaces 1 and 2 opposing each other in the first direction, third and fourth surfaces 3 and 4 connected to the first and second surfaces 1 and 2 and opposing in the second direction, and fifth and sixth surfaces 5 and 6 connected to the first and second surfaces 1 and 2 and the third and fourth surfaces 3 and 4 and opposing each other in the third direction.

In an example embodiment, the body 110 may have a first 1-3 corner connecting the first surface to the third surface, a 1-4 corner connecting the first surface to the fourth surface, a 2-3 corner connecting the second surface to the third surface and a 2-4 corner connecting the second surface to the fourth surface. The 1-3 corner and the 2-3 corner may have a form contracted in a direction of a center of the body taken in the first direction toward the third surface, and the 1-4 corner and the corner 2-4 may have a form contracted in a direction of a center of the body taken in the first direction toward the fourth face.

As a margin region in which the internal electrodes 121 and 122 are not disposed may overlap the dielectric layer 111, a step difference may be formed due to the thickness of the internal electrodes 121 and 122, and accordingly, the corner connecting the first surface to the third to sixth surfaces and/or the corner connecting the second surface to the third to the sixth surfaces may have a form contracted in a direction of a center of the body taken in the first direction with respect to the first surface or the second surface. Alternatively, a corner connecting the first surface 1 to the third to sixth surfaces 3, 4, 5, and 6 and/or a corner connecting the second surface 2 to the third to sixth surfaces 3, 4, 5, and 6 may have a form contracted in a direction of a center of the body taken in the first direction with respect to the first surface or the second surface. Alternatively, as the corners connecting the surfaces of the body 110 are rounded by performing a separate process to prevent chipping defects, or the like, the corners connecting the first and third to sixth surfaces and/or the corner connecting the second surface to the third to sixth surfaces may have a rounded shape.

The corner may include a first 1-3 corner connecting the first surface to the third surface, a 1-4 corner connecting the first surface to the fourth surface, a 2-3 corner connecting the second surface to the third surface and a 2-4 corner connecting the second surface to the fourth surface. Also, the corners may include a 1-5 corner connecting the first surface to the fifth surface, a 1-6 corner connecting the first surface to the sixth surfaces, a 2-5 corner connecting the second surface to the fifth surface, and a 2-6 corner connecting the second surface to the sixth surface. The first to sixth surfaces of the body 110 may be almost flat surfaces, and non-flat regions may be configured as corners. Hereinafter, an extension line of each surface may refer to a line extended with respect to a flat portion of each surface.

In this case, the region disposed on the corner of the body 110 in the external electrodes 131 and 132 may be a corner portion, the region disposed on the third and fourth surfaces of the body 110 may be a connection portion, and the region disposed on the first and second surfaces of the body may be a band portion.

To prevent a step difference caused by the internal electrodes 121 and 122, after lamination, when the internal electrodes are cut to be exposed to the fifth and sixth surfaces 5 and 6 of the body, a single dielectric layer or two or more dielectric layers may be laminated on both side surfaces of the capacitance formation portion Ac in the third direction (width direction) to form margin portions 114 and 115, the portion connecting the first surface to the fifth and sixth surfaces and the portion connecting the second surface to the fifth and sixth surfaces may not have a contracted form.

The plurality of dielectric layers 111 forming the body 110 may be in a fired state, and a boundary between the adjacent dielectric layers 111 may be integrated with each other such that the boundary may not be distinct without using a scanning electron microscope (SEM).

In an example embodiment, a raw material for forming the dielectric layer 111 is not limited to any particular example as long as sufficient capacitance may be obtained. For example, a barium titanate material, a lead composite perovskite material, or a strontium titanate material may be used. The barium titanate material may include BaTiO₃ ceramic powder, and an example of the ceramic powder may include (Ba_(1-x)Ca_(x))TiO₃ (0<x<1), Ba(Ti_(1-y)Ca_(y))O₃ (0<y<1), (Ba_(1-x)Ca_(x)) (Ti_(1-y)Zr_(y))O₃ (0<x<1, 0<y<1) or Ba(Ti_(1-y)Zr_(y))O₃ (0<y<1) in which Ca (calcium), Zr (zirconium) is partially solid-solute.

Also, various ceramic additives, organic solvents, binders, dispersants, or the like, may be added to a raw material for forming the dielectric layer 111 in the example embodiment to powder such as barium titanate (BaTiO₃).

The average thickness td of the dielectric layer 111 is not limited to any particular example.

However, generally, when the dielectric layer has a thickness of less than 0.6 μm, which is relatively thin, in particular, when the thickness of the dielectric layer is 0.35 μm or less, reliability may decrease.

In an example embodiment, by disposing an insulating layer on the connection portion of the external electrode, and disposing the plating layer on the band portion of the external electrode, permeation of external moisture and the plating solution may be prevented, such that reliability may improve. Accordingly, excellent reliability may be ensured even when the average thickness of the dielectric layer 111 is 0.35 μm or less.

Accordingly, when the average thickness of the dielectric layer 111 is 0.35 μm or less, the effect of improving reliability in the example embodiment may improve.

The average thickness td of the dielectric layer 111 may refer to an average thickness of the dielectric layer 111 disposed between the first and second internal electrodes 121 and 122.

The average thickness of the dielectric layer 111 may be measured by scanning a cross-sectional surface of the body 110 taken in the length and thickness direction (L-T) using a scanning electron microscope (SEM) at 10,000× magnification. More specifically, an average value may be measured by measuring thicknesses of 30 points of the dielectric layer, spaced apart by an equal distance, on the scanned image in the length direction. The 30 points spaced apart by an equal distance may be designated in the capacitance formation portion Ac. Also, when the measuring of the average value is extended to 10 dielectric layers and measuring an average value thereof, the average thickness of the dielectric layers may be further generalized.

The body 110 may include the capacitance formation portion Ac disposed in the body 110 and including the first internal electrode 121 and the second internal electrode 122 opposing each other with the dielectric layer 111 interposed therebetween, and cover portions 112 and 113 formed on upper and lower portions of the capacitance formation portion Ac in the first direction.

Also, the capacitance formation portion Ac may contribute to the formation of capacitance of the capacitor, and may be formed by alternately laminating the plurality of first and second internal electrodes 121 and 122 with the dielectric layer 111 interposed therebetween.

The cover portions 112 and 113 may include an upper cover portion 112 disposed on the capacitance formation portion Ac in the first direction and a lower cover portion 113 disposed below the capacitance formation portion Ac in the first direction.

The upper cover portion 112 and the lower cover portion 113 may be formed by laminating a single dielectric layer or two or more dielectric layers on the upper and lower surfaces of the capacitance formation portion Ac in the thickness direction, respectively, and may prevent damages to the internal electrodes caused by physical or chemical stress.

The upper cover portion 112 and the lower cover portion 113 may not include an internal electrode, and may include the same material as that of the dielectric layer 111.

That is, the upper cover portion 112 and the lower cover portion 113 may include a ceramic material, such as, for example, a barium titanate (BaTiO₃) ceramic material.

The average thickness of the cover portions 112 and 113 is not limited to any particular example. However, to easily implement miniaturization and high capacitance of the multilayer electronic component, the average thickness tc of the cover portions 112 and 113 may be 15 μm or less. Also, in an example embodiment, by disposing the insulating layer on the connection portion of the external electrode and the plating layer on the band portion of the external electrode, permeation of external moisture and a plating solution may be prevented such that reliability may improve. Accordingly, excellent reliability may be ensured even when the average thickness tc of the cover portions 112 and 113 is 15 μm or less.

The average thickness tc of the cover portions 112 and 113 may refer to a size in the first direction, and may be an average value of thicknesses of five points of the cover portions 112 and 113, spaced apart by an equal distance, in the first direction above or below the capacitance formation portion Ac. The average thickness may be measured by scanning a cross-sectional surface of the body 110 using a scanning electron microscope (SEM). Other methods and/or tools appreciated by one of ordinary skill in the art, even if not described in the present disclosure, may also be used.

Also, margin portions 114 and 115 may be disposed on a side surface of the capacitance formation portion Ac.

The margin portions 114 and 115 may include the first margin portion 114 disposed on the fifth surface 5 of the body 110 and the second margin portion 115 disposed on the sixth surface 6 of the body 110. That is, the margin portions 114 and 115 may be disposed on both end surfaces of the ceramic body 110 in the width direction.

The margin portions 114 and 115 may refer to a region of a boundary surface between both ends of the first and second internal electrodes 121 and 122 and the body on the cross-section of the body 110 taken in the width-thickness (W-T) direction.

The margin portions 114 and 115 may prevent damage to the internal electrodes caused by physical or chemical stress.

The margin portions 114 and 115 may be formed by forming internal electrodes by applying a conductive paste on a ceramic green sheet other than the region in which the margin portion is formed.

Also, to prevent the step difference due to the internal electrodes 121 and 122, after lamination, the internal electrodes may be cut to be exposed to the fifth and sixth surfaces 5 and 6 of the body, and a single dielectric layer or two or more dielectric layers may be laminated on both side surfaces of the capacitance formation portion Ac in the third direction (width direction), thereby forming the margin portions 114 and 115.

The width of the margin portion 114 and 115 is not limited to any particular example. However, an average width of the margin portions 114 and 115 may be 15 μm or less to easily obtain miniaturization and high capacitance of the multilayer electronic component. Also, in an example embodiment, by disposing the insulating layer on the connection portion of the external electrode and disposing the plating layer on the band portion of the external electrode, permeation of external moisture and a plating solution may be prevented such that reliability may improve. Accordingly, excellent reliability may be ensured even when the average width of the margin portions 114 and 115 is 15 μm or less.

The average width of the margin portions 114 and 115 may refer to the average size of the margin portions 114 and 115 in the third direction, and may be an average value of thicknesses of five points of the margin portions 114 and 115, spaced apart by an equal distance, in the third direction on the side surface of the capacitance formation portion Ac.

The internal electrodes 121 and 122 may be alternately laminated with the dielectric layer 111.

The internal electrodes 121 and 122 may include first and second internal electrodes 121 and 122. The first and second internal electrodes 121 and 122 may be alternately disposed to oppose each other with the dielectric layer 111 included in the body 110 interposed therebetween, and may be exposed to the third and fourth surfaces 3 and 4 of the body 110, respectively.

Referring to FIG. 3 , the first internal electrode 121 may be spaced apart from the fourth surface 4 and may be exposed through the third surface 3, and the second internal electrode 122 may be spaced apart from the third surface 3 and may be exposed through the fourth surface 4. The first external electrode 131 may be disposed on the third surface 3 of the body and may be connected to the first internal electrode 121, and the second external electrode 132 may be disposed on the fourth surface 4 of the body and may be connected to the second internal electrode 122.

That is, the first internal electrode 121 may not be connected to the second external electrode 132, and may be connected to the first external electrode 131, and the second internal electrode 122 may not be connected to the first external electrode 131 and may be connected to the second external electrode 132. Accordingly, the first internal electrode 121 may be spaced apart from the fourth surface 4 by a predetermined distance, and the second internal electrode 122 may be spaced apart from the third surface 3 by a predetermined distance.

In this case, the first and second internal electrodes 121 and 122 may be electrically separated from each other by the dielectric layer 111 disposed therebetween.

The body 110 may be formed by alternately laminating a ceramic green sheet on which the first internal electrode 121 is printed and a ceramic green sheet on which the second internal electrode 122 is printed, and firing the sheets.

The material for forming the internal electrodes 121 and 122 is not limited to any particular example, and a material having excellent electrical conductivity may be used. For example, the internal electrodes 121 and 122 may include one or more of nickel (Ni), copper (Cu), palladium (Pd), silver (Ag), gold (Au), platinum (Pt), tin (Sn), or tungsten (W), titanium (Ti), and alloys thereof.

Also, the internal electrodes 121 and 122 may be formed by printing a conductive paste for internal electrodes including one or more of nickel (Ni), copper (Cu), palladium (Pd), silver (Ag), gold (Au), platinum (Pt), tin (Sn), tungsten (W), titanium (Ti), and alloys thereof. As the method of printing the conductive paste for internal electrodes, a screen printing method or a gravure printing method may be used, but an example embodiment thereof is not limited thereto.

The average thickness te of the internal electrodes 121 and 122 is not limited to any particular example.

However, generally, when the internal electrode is formed to have a thickness of less than 0.6 μm, which is relatively thin, in particular, when the thickness of the internal electrode is 0.35 μm or less, reliability may be deteriorated.

In an example embodiment, by disposing an insulating layer on the connection portion of the external electrode, and disposing the plating layer on the band portion of the external electrode, permeation of external moisture and a plating solution may be prevented such that reliability may improve. Accordingly, excellent reliability may be secured even when the average thickness of the internal electrodes 121 and 122 is 0.35 μm or less.

Accordingly, when the thickness of the internal electrodes 121 and 122 is 0.35 μm or less on average, the effect in the example embodiment may improve, and miniaturization and high capacitance of the ceramic electronic component may be easily obtained.

The average thickness te of the internal electrodes 121 and 122 may refer to the average thickness of the internal electrodes 121 and 122.

The average thickness of the internal electrodes 121 and 122 may be measured by scanning a cross-sectional surface of the body 110 taken in the length and thickness direction (L-T) using a scanning electron microscope (SEM) at 10,000 magnification. More specifically, an average value may be measured by measuring thicknesses of 30 points of the dielectric layer, spaced apart by an equal distance, from the scanned image in the length direction. The 30 points spaced apart by an equal distance may be designated in the capacitance formation portion Ac. Also, when the measuring of the average value is extended to 10 dielectric layers and an average value thereof is measured, the average thickness of the dielectric layers may be further generalized.

The external electrodes 131 and 132 may be disposed on the third surface 3 and the fourth surface 4 of the body 110. The external electrodes 131 and 132 may include first and second external electrodes 131 and 132 disposed on the third and fourth surfaces 3 and 4 of the body 110, respectively, and connected to the first and second internal electrodes 121 and 122, respectively.

The external electrodes 131 and 132 may include the first external electrode 131 including a first connection portion 131 a disposed on the third surface and a first band portion 131 b extending from the first connection portion to a portion of the first surface, and the second external electrode 132 including a second connection portion 132 a disposed on the fourth surface, and a second band portion 132 b extending from the second connection portion to a portion of the first surface. The first connection portion 131 a may be connected to the first internal electrode 121 on the third surface, and the second connection portion 132 a may be connected to the second internal electrode 122 on the fourth surface.

Also, the first external electrode 131 may include a third band portion 131 c extending from the first connection portion 131 a to a portion of the second surface, and the second external electrode 132 may include a fourth band portion 132 c extending from the connection portion 132 a to a portion of the second surface. Further, the first external electrode 131 may include a first side band portion extending from the first connection portion 131 a to portions of the fifth and sixth surfaces, and the second external electrode 132 may include a second side band portion extending from the second connection portion 132 a to portions of the fifth and sixth surfaces.

However, the third band portion, the fourth band portion, the first side band portion and the second side band portion may not be provided in the example embodiment. The first and second external electrodes 131 and 132 may not be disposed on the second surface and may not be disposed on the fifth and sixth surfaces. As the first and second external electrodes 131 and 132 are not disposed on the second surface, the first and second external electrodes 131 and 132 may be disposed below an extension line of the second surface of the body. Also, the first and second connection portions 131 a and 132 a may be spaced apart from the fifth and sixth surfaces, and the first and second connection portions 131 a and 132 a may be spaced apart from the second surface. Also, the first and second band portions 131 b and 132 b may also be spaced apart from the fifth and sixth surfaces.

When the first and second external electrodes 131 and 132 include the third and fourth band portions 131 c and 132 c, an insulating layer may be formed on the third and fourth band portions 131 c and 132 c in the example embodiment, but an example embodiment thereof is not limited thereto. A plating layer may be disposed on the third and fourth band portions 131 c and 132 c to improve mounting convenience. Also, the first and second external electrodes 131 and 132 may include the third and fourth band portions 131 c and 132 c and may not include the side band portions, and in this case, the first and second connection portions 131 a and 132 a and the first to fourth band portions 131 b, 132 b, 131 c, and 132 c may be spaced apart from the fifth and sixth surfaces.

In the example embodiment, the ceramic electronic component 100 may have two external electrodes 131 and 132. However, the number of the external electrodes 131 and 132 and the shape thereof may vary depending on the shapes of the internal electrodes 121 and 122 or other purposes.

The external electrodes 131 and 132 may be formed using any material having electrical conductivity, such as metal, and a specific material may be determined in consideration of electrical properties and structural stability, and may have a multilayer structure.

The external electrodes 131 and 132 may be a fired electrode including a conductive metal and glass, or a resin-based electrode including a conductive metal and a resin.

Also, the external electrodes 131 and 132 may have a shape in which a plastic electrode and a resin-based electrode are formed in order on a body. Also, the external electrodes 131 and 132 may be formed by transferring a sheet including a conductive metal onto the body or by transferring a sheet including a conductive metal to the fired electrode.

As the conductive metal included in the external electrodes 131 and 132, a material having excellent electrical conductivity may be used, and the material is not limited to any particular example. For example, the conductive metal may be one or more of Cu, Ni, Pd, Ag, Sn, Cr, and alloys thereof. Preferably, the external electrodes 131 and 132 may include at least one of Ni and a Ni alloy, and accordingly, connectivity with the internal electrodes 121 and 122 including Ni may improve.

The insulating layer 151 may be disposed on the first and second connection portions 131 a and 132 a.

Since the first and second connection portions 131 a and 132 a are connected to the internal electrodes 121 and 122, the first and second connection portions 131 a and 132 a may become paths through which a plating solution may permeate in a plating process or moisture may permeate during actual use. In the example embodiment, since the insulating layer 151 is disposed on the connection portions 131 a and 132 a, permeation of external moisture or a plating solution may be prevented.

The insulating layer 151 may be in contact with the first and second plating layers 141 and 142. In this case, the insulating layer 151 may be in contact with and may partially cover ends of the first and second plating layers 141 and 142, or the first and second plating layers 141 and 142 be in contact with and may partially cover ends of the insulating layer 151.

The insulating layer 151 may be disposed on the first and second connection portions 131 a and 132 a, and may be disposed to cover the second surface and the third and fourth band portions 131 c and 132 c. In this case, the insulating layer 151 may cover the third and fourth band portions 131 c and 132 c, and regions in which the third and fourth band portions 131 c and 132 c are not disposed on the second surface. Accordingly, the insulating layer 151 may cover the region in which the ends of the third and fourth band portions 131 c and 132 c are in contact with the body 110 and may block the moisture permeation path, thereby improving moisture resistance reliability.

The insulating layer 151 may be disposed on the second surface and may extend to the first and second connection portions 131 a and 132 a. Also, when the external electrodes 131 and 132 are not disposed on the second surface, the insulating layer may be disposed to entirely cover the second surface. The insulating layer 151 may not necessarily be disposed on the second surface, and the insulating layer may not be disposed on a portion or an entirety of the second surface, and also, the insulating layer may be divided into two portions and the two portions may be disposed on the first and second connection portions 131 a and 132 a, respectively. When the insulating layer is not disposed on an entirety of the second surface, the insulating layer may be disposed below an extension line of the second surface. Also, the insulating layer may not be disposed on the second surface, and the insulating layer may extend from the first and second connection portions 131 a and 132 a to the fifth and sixth surfaces and may form an insulating layer.

Further, the insulating layer 151 may be disposed to cover portions of the first and second side band portions, the fifth surface, and the sixth surface. In this case, portions of the fifth and sixth surfaces not covered by the insulating layer 151 may be exposed.

Also, the insulating layer 151 may be disposed to cover the first and second side band portions and the fifth and sixth surfaces, and in this case, the fifth and sixth surfaces may not be exposed, such that moisture resistance reliability may improve. The connection portions 131 a and 132 a may not also be directly exposed, thereby improving reliability of the multilayer electronic component 1000. In greater detail, the insulating layer may cover both the first and second side band portions, and may cover entire regions of the fifth and sixth surfaces other than the region in which the first and second side band portions are formed.

The insulating layer 151 may prevent the plating layers 141 and 142 from being formed on the external electrodes 131 and 132 on which the insulating layer 151 is disposed, and may improve sealing properties, such that permeation of moisture or a plating solution may be reduced.

The insulating layer may include an oxide including silicon (Si).

To mount a multilayer electronic component on a substrate, a solder reflow process may be necessary. In this process, as temperature rises and falls, thermal expansion and thermal reduction may occur, which may apply tensile stress to the multilayer electronic component. Such tensile stress may cause cracks in the multilayer electronic component such that electrical properties may deteriorate.

Generally, to protect a multilayer electronic component from thermal impact caused by thermal expansion and thermal reduction, an insulating layer may be formed of a glass-based material on a portion of the surface of the external electrode and the body.

The insulating layer including a glass-based material may be formed by forming a glass powder or a glass paste and raising and lowering a temperature near a softening point. In this case, during the process of raising and lowering the temperature of the insulating layer, aggregation of the insulating layer may occur, such that it may be difficult to form a uniform film. Also, since hardness of the insulating layer increases at a temperature below the softening point and stress may be transmitted to the multilayer electronic component, cracks and delamination may occur in the multilayer electronic component. Also, in the process of increasing the temperature, a metal of the external electrodes 131 and 132 included in the multilayer electronic component 1000 may diffuse into the internal electrodes 121 and 122, which may cause radiation cracks. In particular, when the thickness of the insulating layer 151 and the internal electrodes 121 and 122 is reduced to increase capacitance and miniaturization of the multilayer electronic component 1000, the multilayer electronic component 1000 may become vulnerable to radiation cracks and delamination.

The insulating layer 151 in the multilayer electronic component 1000 in an example embodiment includes an oxide including Si, aggregation of the insulating layer may be prevented and a uniform film may be formed, and as hardness increases at high temperature, stress transmitted to the multilayer electronic component 1000 may be prevented. Also, when the insulating layer including the oxide including Si is formed at a temperature lower than that of a general glass layer, diffusion of a metal of the external electrodes 131 and 132 included in the multilayer electronic component 1000 into the internal electrodes 121 and 122 may be prevented, such that radiation cracks may be reduced.

As the content of Si included in the insulating layer 151 is higher, the permeation of external moisture may be effectively prevented as compared to an insulating layer having the same thickness and formed of other materials, and corrosion resistance against acids or bases such as a plating solution may improve.

In an example embodiment, in the insulating layer, the number of moles of Si atoms relative to the number of moles of elements other than oxygen may be 0.95 or more. That is, the insulating layer 151 may be substantially formed of an oxide including Si, other than elements detected as impurities.

A method of forming the insulating layer 151 including an oxide including Si may be varied. For example, the insulating layer 151 may be formed by sol-gel processing, chemical vapor deposition (CVD), atomic layer deposition (ALD), and the like, but an example embodiment thereof is not limited thereto, and the insulating layer 151 may be formed by another method for forming a uniform insulating layer.

The oxide including Si may be silica (SiO₂). Silica (SiO₂) may form a thinner and more uniform insulating layer 151 than common glass-based materials, and may have superior impact resistance and corrosion resistance as compared to other inorganic materials such as alumina (Al₂O₃).

In an example embodiment, the oxide including Si included in the insulating layer 151 may be silica (SiO₂), and accordingly, the insulating layer 151 of the multilayer electronic component 1000 may be uniformly formed. Cracks and delamination may be prevented and radiation cracks may be prevented.

When the insulating layer 151 includes an oxide including Si as in the multilayer electronic component 1000 in an example embodiment, each material included in the insulating layer may be unstable.

Oxide including boron may form a compound along with other materials included in the insulating layer, such as SiO₂, ZnO, and the like, thereby stabilizing the insulating layer. In an example embodiment, the insulating layer 151 including an oxide including Si may further include an oxide including boron and may organically bond respective materials, thereby improving stability of the insulating layer 151.

In particular, when the insulating layer 151 includes an oxide including boron, the oxide may react with barium oxide on the surface of the body 110 at a low temperature, thereby forming eutectic. Accordingly, in an example embodiment, the multilayer electronic component 1000 may further include an adhesive layer including barium and boron at an interfacial surface between the insulating layer 151 further including an oxide including boron and the body 110.

Since the material included in the insulating layer is an insulating material such as SiO₂ and B₂O₃, adhesion force with the first and second external electrodes 131 and 132 including the conductive metal may not be good. In the multilayer electronic component 1000 in an example embodiment, although adhesion force between the insulating layer 151 and the first and second external electrodes 131 and 132 is not good, adhesion force with the body 110 including the insulating material may be good, such that overall strength of the multilayer electronic component 1000 may improve.

More preferably, the oxide including boron included in the insulating layer 151 and the barium oxide included in the body 110 may form eutectic bonding at an interfacial surface between the insulating layer 151 and the body 110, and an adhesive layer including barium and boron may be formed, and accordingly, overall strength of the multilayer electronic component 1000 may improve.

In an example embodiment, the insulating layer 151 may further include an oxide including boron, and an adhesive layer including barium and boron may be further provided on an interfacial surface between the insulating layer 151 and the body 110. Accordingly, adhesion force between the insulating layer 151 and the body 110 may improve, and overall strength of the multilayer electronic component 1000 may improve.

In this case, the component of the insulating layer 151 may be calculated from an image observed using scanning electron microscope—energy dispersive x-ray spectroscopy (SEM-EDS). Specifically, the multilayer electronic component may be polished to a central position in the width direction (third direction) and a cross-section (L-T cross-section) taken in a length and thickness direction may be exposed, and the type and number of moles of each element included in the insulating layer may be measured using EDS in the region among regions obtained by dividing the insulating layer into 5 regions in the thickness direction, and the number of moles of Si atoms or the number of moles of boron atoms based on the total number of moles of elements other than oxygen atoms may be calculated.

The multilayer electronic component 1000 in an example embodiment may include a dielectric layer 111 and first and second internal electrodes 121 and 122 alternately disposed with the dielectric layer 111 interposed therebetween, and may further include a body 110 including first and second surfaces 1 and 2 opposing each other in the first direction, third and fourth surfaces 3 and 4 connected to the first and second surfaces 1 and 2 and opposing in the second direction, and fifth and sixth surfaces 5 and 6 connected to the first and second surfaces 1 and 2 and the third and fourth surfaces 3 and 4 and opposing each other in the third direction; a first external electrode including a first connection portion 131 a disposed on the third surface and a first band portion 131 b extending from the first connection portion to a portion of the first surface; a second external electrode 132 including a second connection portion 132 a disposed on the fourth surface and a second band portion 132 b extending from the second connection portion to a portion of the first surface; an insulating layer 151 disposed on the second surface and extending to a portion of the first and second connection portions; plating layers 141 and 142 disposed on the first and second band portions 131 b and 132 b, and the insulating layer 151 may include at least one of an oxide including boron (B), borosilicate, and zinc-borosilicate.

Generally, the insulating layer including the glass-based material may have a thermal expansion coefficient relatively larger than that of the ceramic body or the external electrode and may apply excessive stress to the multilayer electronic component.

When the insulating layer includes an oxide including boron, the insulating layer may be formed at a lower temperature than an insulating layer including a glass-based material, thereby preventing radiation cracks which may be created in the process of forming an insulating layer, and the insulating layer may be formed by various methods such as liquid and gaseous methods.

Also, the insulating layer including the oxide including boron may have a coefficient of thermal expansion lower than that of an insulating layer including a glass-based material, such that, even when heat treatment is performed on the multilayer electronic component or a thermal impact is applied from the outside, stress applied to the multilayer electronic component may be reduced, and as the insulating layer may have relatively improved resistance against physical impact, the insulating layer may act as a buffer to protect the multilayer electronic component.

In an example embodiment, by configuring the insulating layer 151 to include an oxide including boron, reliability of the multilayer electronic component 1000 may improve.

The oxide including boron may be preferably formed of B2O3, but an example embodiment thereof is not limited thereto.

In an example embodiment, in the insulating layer 151, the number of moles of boron atoms based on the total number of moles of elements other than oxygen atoms may be 0.95 or more. That is, the insulating layer 151 may be substantially formed of an oxide including boron other than elements detected as impurities.

Borosilicate may have high corrosion resistance compared to oxides including boron, such that borosilicate may work as an insulating layer and may also protect the multilayer electronic component from permeation of a plating solution, and borosilicate may have low moisture permeability. In an example embodiment, since the insulating layer 151 includes borosilicate, permeation of moisture and a plating solution into the multilayer electronic component 1000 may be prevented, thereby improving reliability.

In an example embodiment, in the insulating layer 151, the number of moles of boron and silicon atoms based on the total number of moles of elements other than oxygen atoms may be 0.95 or more. That is, the insulating layer 151 may be substantially formed of borosilicate other than elements detected as impurities.

Zinc-borosilicate may be formed at a lower temperature than borosilicate, thereby further preventing radiation cracks, and wettability with metals such as Cu included in the external electrode may be good.

In an example embodiment, the insulating layer 151 includes zinc-borosilicate, radiation cracks may be prevented and bonding force between the insulating layer 151 and the first and second external electrodes 131 and 132 may improve. Also, permeation of a plating solution and moisture may be prevented through improved bonding strength, thereby contributing to improving reliability of the multilayer electronic component 1000.

In an example embodiment, in the insulating layer 151, the number of moles of boron, silicon, and zinc atoms based on the total number of moles of elements other than oxygen atoms may be 0.95 or more. That is, the insulating layer 151 may be substantially formed of zinc-borosilicate other than elements detected as impurities.

A method of forming the insulating layer including at least one of boric oxide, borosilicate, and zinc-borosilicate may be varied. For example, the insulating layer may be formed by sol-gel processing, chemical vapor deposition (CVD), atomic layer deposition (ALD), and the like, but an example embodiment thereof is not limited thereto, and the insulating layer may be formed by another method for forming a uniform insulating layer.

In this case, the component of the insulating layer 151 may be calculated from an image observed using scanning electron microscope—energy dispersive x-ray spectroscopy (SEM-EDS). Specifically, the multilayer electronic component may be polished to a central position in the width direction (third direction) and a cross-section (L-T cross-section) taken in a length and thickness direction may be exposed, and the type and number of moles of each element included in the insulating layer may be measured using EDS in the region among regions obtained by dividing the insulating layer into 5 regions in the thickness direction, and the number of moles of Si atoms or the number of moles of boron atoms based on the total number of moles of elements other than oxygen atoms may be calculated.

In an example embodiment, the insulating layer 151 may include at least one or more of an oxide including boric oxide, borosilicate, and zinc-borosilicate, and may further include various additives. By configuring the insulating layer 151 to include at least one of an oxide including boric oxide, borosilicate, and zinc-borosilicate, stress applied to the multilayer electronic component 1000 from external thermal impact may be reduced, such that cracks and delamination may be reduced, and radiation cracks may be prevented, and permeation of a plating solution and external moisture may be prevented such that reliability of the multilayer electronic component 1000 may improve.

The first and second plating layers 141 and 142 may be disposed on the first and second band portions 131 b and 132 b, respectively. The plating layers 141 and 142 may improve mounting properties, and as the plating layers 141 and 142 are disposed on the band portions 131 b and 132 b, the mounting space may be reduced, and also, permeation of the plating solution into an internal electrode may be reduced, such that reliability may improve. One ends of the first and second plating layers 141 and 142 may be in contact with the first surface, and the other ends may be in contact with the insulating layer 151.

The type of the plating layers 141 and 142 is not limited to any particular example, and may be a plating layer including at least one of Cu, Ni, Sn, Ag, Au, Pd, and alloys thereof, and may include a plurality of layers.

As a more specific example of the plating layers 141 and 142, the plating layers 141 and 142 may be a Ni plating layer or a Sn plating layer, and a Ni plating layer and a Sn plating layer may be formed in sequence on the first and second band portions 131 b and 132 b.

In an example embodiment, the first and second plating layers 341 and 342 may be extended to partially cover the first and second connection portions 331 a and 332 a, respectively. When an average distance in the first direction from the first surface 1 to an internal electrode disposed most adjacent (closest) to the first surface 1 among the internal electrodes 121 and 122 is defined as H1, and an average distance in the first direction from an extension line of the first surface 1 to ends of the plating layers 141 and 142 disposed on the first and second connection portions 131 a and 132 a is defined as H2, H1>H2 may be satisfied. Accordingly, permeation of the plating solution into the internal electrode during the plating process may be prevented, thereby improving reliability.

H1 and H2 may be average values of values measured at five points spaced apart by an equal distance in the third direction on a cross-section (L-T cross-section) obtained by cutting the body 110 in the first and second directions. For example, the measurements may be taken by scanning the cross-section of the body 110 using a scanning electron microscope (SEM). Other methods and/or tools appreciated by one of ordinary skill in the art, even if not described in the present disclosure, may also be used. H1 may be an average value of values measured at the point at which the internal electrode disposed most adjacent (closest) to the first surface 1 is connected to the external electrode in each cross-section, H2 is an average value of values measured with reference to an end of the plating layer in contact with the external electrode in each cross-section, and the extension lines of the first surface which may be a reference of when H1 and H2 are measured may be the same.

In an example embodiment, the first plating layer 141 may be disposed to cover the end disposed on the first external electrode 131 of the insulating layer 151, and the second plating layer 142 may be disposed to cover the end disposed on the second external electrode 132 of the insulating layer 151. Accordingly, cohesion force between the insulating layer 151 and the plating layers 141 and 142 may be strengthened, such that reliability of the multilayer electronic component 1000 may improve.

In an example embodiment, the insulating layer 151 may be disposed to cover the end disposed on the first external electrode 131 of the insulating layer 151, and the insulating layer 151 may be disposed to cover the end disposed on the second external electrode 132 of the insulating layer 151. Accordingly, cohesion force between the insulating layer 151 and the plating layers 141 and 142 may be strengthened, such that reliability of the multilayer electronic component 1000 may improve.

In an example embodiment, the average size of the body in the second direction is defined as L, the average distance in the second direction from an extension line of the third surface to an end of the first band portion is defined as B1, and the average size of the body in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, 0.2≤B1/L≤0.4 and 0.2≤B2/L≤0.4 may be satisfied.

When B1/L and B2/L are less than 0.2, it may be difficult to secure sufficient fixing strength. When B2/L is greater than 0.4, a leakage current may be generated between the first band portion 331 b and the second band portion 332 b under a high-voltage current, and the first band portion 331 b and the second band portion 332 b may be electrically connected due to plating spread.

B1, B2, and L may be average values of values measured at five points spaced apart by an equal distance in the third direction on a cross-section (L-T cross-section) obtained by cutting the body 110 in the first and second directions. For example, the measurements may be taken by scanning the cross-section of the body 110 using a scanning electron microscope (SEM). Other methods and/or tools appreciated by one of ordinary skill in the art, even if not described in the present disclosure, may also be used.

Referring to FIG. 5 illustrating a mounting substrate 180 on which the multilayer electronic component 1000 is mounted, the plating layers 141 and 142 of the multilayer electronic component 1000 may be bonded to each other by electrode pads 181 and 182 and solder 191 and 192 disposed on the substrate 180.

When the internal electrodes 121 and 122 are laminated in the first direction, the multilayer electronic component 1000 may be horizontally mounted on the substrate 180 such that the internal electrodes 121 and 122 are parallel to the mounting surface. However, the example embodiment is not limited to the example of horizontal mounting, and when the internal electrodes 121 and 122 are laminated in the third direction, the multilayer electronic component may be vertically mounted on the substrate such that the internal electrodes 121 and 122 may be perpendicular to the mounting surface.

The size of the multilayer electronic component 1000 is not limited to any particular example.

However, to obtain both miniaturization and high capacitance, it may be necessary to increase the number of laminated layers by reducing the thicknesses of the dielectric layer and the internal electrode. Accordingly, the effect of improving reliability and capacitance per unit volume in the example embodiment may be significant in a multilayer electronic component having a size of 1005 (length×width to be 1.0 mm×0.5 mm) or less.

Accordingly, when manufacturing errors, external electrode sizes, or the like are considered, when the length of the ceramic electronic component 100 is 1.1 mm or less and the width is 0.55 mm or less, the effect of improving reliability in the example embodiment may improve. Here, the length of the multilayer electronic component 1000 may refer to a maximum size of the multilayer electronic component 1000 in the second direction, and the width of the multilayer electronic component 1000 may refer to a maximum size of the multilayer electronic component 1000 in the third direction. For example, the maximum sizes may be obtained by using an optical microscope. Other methods and/or tools appreciated by one of ordinary skill in the art, even if not described in the present disclosure, may also be used.

FIG. 6 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment. FIG. 7 is a cross-sectional diagram taken along line II-II′ in FIG. 6 .

Referring to FIGS. 6 and 7 , in the multilayer electronic component 1001 in an example embodiment, the first and second plating layers 141-1 and 142-1 may be disposed below the extension line E1 of the first surface. Accordingly, the height of the solder may be reduced during mounting, and the mounting space may be reduced.

Also, the insulating layer 151-1 may extend to a region below the extension line of the first surface and may be in contact with the first and second plating layers 141-1 and 142-1.

FIG. 8 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment. FIG. 9 is a cross-sectional diagram taken along line III-III′ in FIG. 8 .

Referring to FIGS. 8 and 9 , the multilayer electronic component 1002 in an example embodiment may further include an additional insulating layer 161 disposed on the first surface 1 and disposed between a first band portion 131 b and a second band portion 132 b. Accordingly, a leakage current which may occur between the first band portion 131 b and the second band portion 132 b under a high voltage current may be prevented.

The type of the additional insulating layer 161 is not limited to any particular example. For example, the additional insulating layer 161 may include at least one of an oxide including Si, an oxide including boron, borosilicate, and zinc-borosilicate, similarly to the insulating layer 151. However, the additional insulating layer 161 and the insulating layer 151 may not be formed using the same material, and the additional insulating layer 161 and the insulating layer 151 may be formed of different materials. For example, the additional insulating layer 161 may include one or more thermosetting resins selected from an epoxy resin, an acrylic resin, and the like. Also, the additional insulating layer 161 may include one or more selected from TiO₂, BaTiO₃, Al₂O₃, SiO₂, and BaO as an additive in addition to polymer resin. Accordingly, bonding force with the body or the external electrode may improve.

FIG. 10 is a perspective diagram illustrating a multilayer electronic component according to an example embodiment. FIG. 11 is a cross-sectional diagram taken along line IV-IV′ in FIG. 10 .

Referring to FIGS. 10 and 11 , in the multilayer electronic component 1003 according to an example embodiment, when an average distance in the first direction from the first surface 1 to an internal electrode disposed most adjacent (closest) to the first surface 1 among the internal electrodes 121 and 122 is defined as H1, and an average distance in the first direction from an extension line of the first surface 1 to ends of the plating layers 141-3 and 142-3 disposed on the first and second connection portions 131 a and 132 a is defined as H2, H1<H2 may be satisfied. Accordingly, the region in contact with solder during mounting may increase, such that bonding force may improve.

More preferably, when an average size of the body 110 in the first direction is defined as T, H2<T/2 may be satisfied. That is, H1<H2<T/2 may be satisfied, which may be because, when H2 is T/2 or more, the effect of improving moisture resistance reliability by the insulating layer may degrade.

H1, H2, and T may be average values of values measured at five points spaced apart by an equal distance in the third direction on a cross-section (L-T cross-section) obtained by cutting the body 110 in the first and second directions. For example, the measurements may be taken by scanning the cross-section of the body 110 using a scanning electron microscope (SEM). Other methods and/or tools appreciated by one of ordinary skill in the art, even if not described in the present disclosure, may also be used. H1 may be an average value of values measured at the point at which the internal electrode disposed most adjacent (closest) to the first surface 1 is connected to the external electrode in each cross-section, H2 is an average value of values measured with reference to an end of the plating layer in contact with the external electrode in each cross-section, and the extension lines of the first surface which may be a reference of when H1 and H2 are measured may be the same. Also, T may be an average value obtained by measuring maximum sizes of the body 110 in the first direction in respective cross-section.

FIG. 12 is a perspective diagram illustrating a multilayer electronic component 1004 according to an example embodiment. FIG. 13 is a cross-sectional diagram taken along line V-V′ in FIG. 12 .

Referring to FIGS. 12 and 13 , in the multilayer electronic component 1004 in an example embodiment, an average length B1 of the first band portion 131 b-4 may be greater than an average length B3 of the third band portion 131 c-4, and an average length of the second band portion 132 b-4 may be greater than an average length B4 of the fourth band portion 132 c-4. Accordingly, the region in contact with the solder during mounting may increase, such that bonding force may improve.

In greater detail, the average distance in the second direction from an extension line of the third surface 3 to an end of the first band portion 131 b-4 is defined as B1, an average distance in the second direction from an extension line of the fourth surface 4 to an end of the second band portion 132 b-4 is defined as B2, an average distance in the second direction from an extension line of the third surface 3 to an end of the third band portion 131 c-4 is defined as B3, and an average distance in the second direction from an extension line of the fourth surface 4 to an end of the fourth band portion 132 c-4 is defined as B4, B3<B1 and B4<B2 may be may be satisfied.

In this case, when an average size of the body 110 in the second direction is defined as L, 0.2≤B1/L≤0.4 and 0.2≤B2/L≤0.4 may be satisfied.

B1, B2, B3, B4 and L may be average values of values measured at five points spaced apart by an equal distance in the third direction on a cross-section (L-T cross-section) obtained by cutting the body 110 in the first and second directions. For example, the measurements may be taken by scanning the cross-section of the body 110 using a scanning electron microscope (SEM). Other methods and/or tools appreciated by one of ordinary skill in the art, even if not described in the present disclosure, may also be used.

Also, the first external electrode 131-4 may include a first side band portion extending from the first connection portion 131 a-4 to portions of the fifth and sixth surfaces, and the second external electrode 132-4 may include a second side band portion extending from the second connection portion 132 a-4 to portions of the fifth and sixth surfaces. In this case, the sizes of the first and second side band portions in the second direction may gradually increase toward the first surface. That is, the first and second side band portions may be disposed in a tapered shape or a trapezoidal shape.

Further, when an average distance in the second direction from an extension line of the third surface to an end of the third band portion 131 c-4 is defined as B3, an average distance in the second direction from an extension line of the fourth surface to an end of the fourth band portion 132 c-4 is defined as B4, an average size of a region, taken in the second direction, in which the third surface and the second internal electrode 122 are spaced apart from each other is defined as G1, and an average size of a region, taken in the second direction, in which the fourth surface and the second internal electrode 122 are spaced apart from each other is defined as G2, B3≤G1 and B4≤G2 may be satisfied. Accordingly, the volume occupied by the external electrode may be reduced, such that capacitance per unit volume of the multilayer electronic component 1004 may be increased.

As for G1 and G2, an average value of sizes in the second direction, spaced apart from the third surface, measured with respect to arbitrary five second internal electrodes disposed in a central portion taken in the first direction on a cross-section obtained by cutting the body in the first and second directions in a center taken in the third direction may be G1, and an average values of sizes in the second direction, spaced apart from the fourth surface, measured with respect to arbitrary five second internal electrodes disposed in a central portion taken in the first direction in a central portion taken in the first direction may be G2. For example, the measurements may be taken by scanning the cross-section of the body 110 using a scanning electron microscope (SEM). Other methods and/or tools appreciated by one of ordinary skill in the art, even if not described in the present disclosure, may also be used.

Further, G1 and G2 may be obtained from the cross section (L-T cross-section) obtained by cutting the body 110 in the first and second directions at five points spaced apart by an equal distance in the third direction, and the average values thereof may be G1 and G2, such that the values may be further generalized.

However, an example embodiment thereof is not limited to B3≤G1 and B4≤G2, and the example in which B3≥G1 and B4≥G2 are satisfied may be included as an example embodiment. Accordingly, in an example embodiment, when an average distance in the second direction from an extension line of the third surface to an end of the third band portion is defined as B3, an average distance in the second direction from an extension line of the fourth surface to an end of the fourth band portion is defined as B4, an average size of the region in which the third surface and the second internal electrode are spaced apart from each other, taken in the second direction, is defined as G1, and an average size of the region in which the fourth surface and the first internal electrode are spaced apart from each other, taken in the second direction, is defined as G2, B3≥G1 and B4≥G2 may be satisfied.

In an example embodiment, when an average distance in the second direction from an extension line of the third surface E3 to an end of the first band portion is defined as B1, and an average distance in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, B1≥G1 and B2≥G2 may be satisfied. Bonding force of the multilayer electronic component 1004 with the substrate 180 may improve.

FIG. 14 is a perspective diagram illustrating a multilayer electronic component 1005 according to an example embodiment. FIG. 15 is a cross-sectional diagram taken along line VI-VI′ in FIG. 14 .

Referring to FIGS. 14 and 15 , the first and second external electrodes 131-5 and 132-5 of the multilayer electronic component 1005 in an example embodiment may not be disposed on the second surface, and may be disposed on the third, fourth, and first surfaces and may have an L-shape. That is, the first and second external electrodes 131-5 and 132-5 may be disposed below an extension line of the second surface.

The first external electrode 131-5 may include a first connection portion 131 a-5 disposed on the third surface 3, and a first band portion 131 b-5 extending from the first connection portion 131 a-5 to a portion of the first surface 1. The second external electrodes 131-5 and 132-5 may include a second connection portion 132 a-5 disposed on the fourth surface 4, and a second band portion 132 b-5 extending from the second connection portion 132 a-5 to a portion of the first surface 1. The external electrodes 131-5 and 132-5 may not be disposed on the second surface 2, such that the insulating layer 151-5 may be disposed to cover the entire second surface 2. Accordingly the volume occupied by the external electrodes 131-5 and 132-5 may be reduced, such that capacitance per unit volume of the multilayer electronic component 1005 may improve. However, an example embodiment thereof is not limited to the example in which the insulating layer 151-5 cover an entirety of the second surface 2, and the insulating layer may not cover a portion or an entirety of the second surface 2, and may be separated therefrom and may cover the first and second connection portions 131 a-5 and 132 a-5.

Also, the insulating layer 151-5 may be disposed to cover portions of the fifth and sixth surfaces, thereby improving reliability. In this case, portions of the fifth and sixth surfaces not covered by the insulating layer 151-5 may be exposed.

Further, the insulating layer 151-5 may be disposed to cover an entirety of the fifth and sixth surfaces, and in this case, the fifth and sixth surfaces may not be exposed, such that moisture resistance reliability may improve.

A first plating layer 141-5 may be disposed on the first band portion 131 b-5, a second plating layer 142-5 may be disposed on the second band portion 132 b-5, and the first and second plating layers 141-5 and 142-5 may extend to a portion on the first and second connection portions 131 a-5 and 132 b-5.

In this case, the external electrodes 131-5 and 132-5 may not be disposed on the fifth and sixth surfaces 5 and 6 as well. That is, the external electrodes 131-5 and 132-5 may be disposed only on the third, fourth, and first surfaces.

An average distance in the first direction from the first surface 1 to an internal electrode disposed most adjacent (closest) to the first surface 1 among the first and second internal electrodes 121 and 122 is defined as H1, and an average distance in the first direction from an extension line of the first surface 1 to ends of the plating layers 141-5 and 142-5 disposed on the first and second connection portions 131 a-5 and 132 a-5 is defined as H2, H1<H2 may be satisfied. Accordingly, the region in contact with solder during mounting may increase such that bonding force may improve, and the area in which the external electrodes 131-5 and 132-5 and the plating layers 141-5 and 142-5 are in contact with each other may increase such that an increase in equivalent series resistance (ESR) may be prevented.

More preferably, when the average size of the body 110 in the first direction is defined as T, H2<T/2 may be satisfied. That is, H1<H2<T/2 may be satisfied, which may be because, when H2 is T/2 or more, the effect of improving moisture resistance reliability by the insulating layer may decrease.

Also, the first and second plating layers 141-5 and 142-5 may be disposed to cover a portion of the insulating layer 151-1 on the third and fourth surfaces. That is, the plating layers 141-5 and 142-5 may be disposed to cover ends of the insulating layer 151-5 on the third and fourth surfaces. Accordingly, bonding force between the insulating layer 151-5 and the plating layers 141-5 and 142-5 may be strengthened such that reliability of the multilayer electronic component 1005 may improve.

Also, the insulating layer 151-5 may be disposed to cover a portion of the first and second plating layers 141-5 and 142-5 on the third and fourth surfaces. That is, the insulating layer 151-5 may be disposed to cover ends of the plating layers 141-5 and 142-5 on the third and fourth surfaces. Accordingly, bonding force between the insulating layer 151-5 and the plating layers 141-5 and 142-5 may be strengthened such that reliability of the multilayer electronic component 1005 may improve.

FIG. 16 is a diagram illustrating a modified example of the example in FIG. 14 . Referring to FIG. 16 , in the modified example 1006 of the multilayer electronic component 1005 in an example embodiment, a first additional electrode layer 134 may be disposed between the first connection portion 131 a-6 and the third surface. A second additional electrode layer 135 may be disposed between the second connection portion 132 a-6 and the fourth surface. The first additional electrode layer 134 may be disposed within a range not deviating from the third surface, and the second additional electrode layer 135 may be disposed within a range not deviating from the fourth surface. The first and second additional electrode layers 134 and 135 may improve electrical connectivity between the internal electrodes 121 and 122 and the external electrodes 131-6 and 132-6, and bonding strength with the external electrodes 131-6 and 132-6 may be excellent, such that mechanical bonding strength of the external electrodes 131-6 and 132-6 may further improve.

The first and second external electrodes 131-6 and 132-6 may have an L-shape in which the first and second external electrodes are not disposed on the second surface.

The first external electrode 131-6 may include a first connection portion 131 a-6 disposed on the first additional electrode layer 134, and a first band portion 131 b-6 extending from the first connection portion 131 a-6 to a portion of the first surface 1. The second external electrode 132-6 may include a second connection portion 132 a-6 disposed on the second additional electrode layer 135 and a second band portion 132 b-6 extending from the second connection portion 132 a-6 to a portion of the first surface 1.

The first and second additional electrode layers 131-6 and 132-6 may be formed of any material having electrical conductivity, such as a metal, and specific materials may be determined in consideration of electrical properties, structural stability, or the like. Also, the first and second additional electrode layers 131-6 and 132-6 may be fired electrodes including a conductive metal and glass, or resin-based electrodes including a conductive metal and resin. Also, the first and second additional electrode layers 131-6 and 132-6 may be formed by transferring a sheet including a conductive metal to the body.

As the conductive metal included in the first and second additional electrode layers 131-6 and 132-6, a material having excellent electrical conductivity may be used, and the material is not limited to any particular example. For example, the conductive metal may be one or more of Cu, Ni, Pd, Ag, Sn, Cr, and alloys thereof. Preferably, the first and second additional electrode layers 131-6 and 132-6 may include at least one of Ni and a Ni alloy, and accordingly, connectivity with the internal electrodes 121 and 122 including Ni may further improve.

FIG. 17 is a perspective diagram illustrating a multilayer electronic component 1007 according to an example embodiment. FIG. 18 is a cross-sectional diagram taken along line VII-VII′ in FIG. 17 .

Referring to FIGS. 17 and 18 , an average thickness t1 of the first and second plating layers 141-6 and 142-6 of the multilayer electronic component 1006 in an example embodiment may be less than an average thickness t2 of the insulating layer 151-6.

The insulating layer 151-6 may prevent permeation of external moisture or the plating solution, but connectivity with the plating layers 141-6 and 142-6 may be relatively weak, which may cause delamination of the plating layer. When the plating layer is delaminated, bonding force with the substrate 180 may be reduced. Here, the delamination of the plating layer 141-6 and 142-6 may refer to separation of a portion of the plating layer or physical separation of the plating layer from the external electrodes 131-5 and 132-5. Since the connection between the plated layer and the insulating layer is relatively weak, it may be highly likely that a gap between the insulating layer and the plated layer may be widened or foreign substances may enter, and the possibility of delamination may increase due to vulnerability to external impacts.

In an example embodiment, by reducing the average thickness of the plated layer t1 to be less than the average thickness of the insulating layer t2, the contact area between the plated layer and the insulating layer may be reduced, thereby preventing delamination and improving bonding force of the multilayer electronic component 1000 with the substrate 180.

The thickness t1 of the first and second plating layers 141-6 and 142-6 may be an average value of thicknesses at 5 points of the first and second connection portions 131 a-5 and 132 a-5 or the first and second band portions 131 b-5 and 132 b-5, spaced apart by an equal distance, and the thickness t2 of the insulating layer 151-6 may be an average value of thicknesses at 5 points of the first and second connection portions 131 a-5 and 132 a-5, spaced apart by an equal distance.

FIG. 19 is a perspective diagram illustrating a multilayer electronic component 2000 according to an example embodiment. FIG. 20 is a cross-sectional diagram taken along line VIII-VIII′ in FIG. 19 .

Hereinafter, a multilayer electronic component 2000 according to an example embodiment will be described, and the description overlapping the aforementioned example embodiment will not be provided.

The multilayer electronic component 2000 in an example embodiment may include a dielectric layer 111 and first and second internal electrodes 121 and 122 alternately disposed with the dielectric layer 111 interposed therebetween, and may further include a body 110 including first and second surfaces 1 and 2 opposing each other in the first direction, third and fourth surfaces 3 and 4 connected to the first and second surfaces 1 and 2 and opposing in the second direction, and fifth and sixth surfaces 5 and 6 connected to the first and second surfaces 1 and 2 and the third and fourth surfaces 3 and 4 and opposing each other in the third direction; a first external electrode 231 including a first connection electrode 231 a disposed on the third surface and a first band electrode 231 b disposed on the first surface and connected to the first connection electrode; a second external electrode 232 including a second connection electrode 232 a disposed on the fourth surface and a second band electrode 232 b disposed on the first surface and connected to the second connection electrode; a first insulating layer 251 disposed on the first connection electrode; a second insulating layer 252 disposed on the second connection electrode; a first plating layer 241 disposed on the first band electrode; and a second plating layer 242 disposed on the second band electrode, wherein the first and second insulating layers 251 and 252 may include an oxide including silicon (Si).

The first connection electrode 231 a may be disposed on the third surface 3 and may be connected to the first internal electrode 121, and the second connection electrode 232 a may be disposed on the fourth surface 4 and may be connected to the second internal electrode 122. Also, a first insulating layer 251 may be disposed on the first connection electrode 231 a′, and a second insulating layer 252 may be disposed on the second connection electrode 232 a.

Generally, when an external electrode is formed, a method of dipping the exposed surface of the internal electrode of the body into paste including a conductive metal using paste including a conductive metal may be mainly used. However, a thickness of the external electrode formed by the dipping method may be excessively increased in a central portion thereof in the thickness direction. Also, in addition to the thickness imbalance of the external electrode by using the dipping method, since the internal electrode is exposed to the third and fourth surfaces, to prevent permeation of moisture and plating solution through the external electrode, the thickness of the external electrode disposed on the third and fourth surfaces may be equal to or greater than a predetermined thickness.

Differently from the above example, in the example embodiment, since the insulating layers 251 and 252 are disposed on the connection electrodes 231 a and 232 a, even when a thickness of the connection electrodes 231 a and 232 a on the third and fourth surfaces is reduced, sufficient reliability may be secured.

The first and second connection electrodes 231 a and 232 a may have a shape corresponding to the third and fourth surfaces, respectively, and the surface of the first and second connection electrodes 231 a and 232 a facing the body 110 may have the same area as the third and fourth surfaces of the body 110. The first and second connection electrodes 231 a and 232 a may be disposed within a range not deviating from the third and fourth surfaces 3 and 4, respectively. The connection electrodes 231 a and 232 a may be disposed to not extend to the first, second, fifth, and sixth surfaces 1, 2, 5, and 6 of the body 110. Specifically, in an example embodiment, the first and second connection electrodes 231 a and 232 a may be spaced apart from the fifth and sixth surfaces, and accordingly, sufficient connectivity between the internal electrodes 121 and 122 and the external electrodes 231 and 232 may be secured, and the volume occupied by the external electrode may be reduced, such that per unit volume of the multilayer electronic component 2000 may increase.

In this regard, the first and second connection electrodes 231 a and 232 a may be spaced apart from the second surface 2. That is, since the external electrodes 231 and 232 are not disposed on the second surface, the volume occupied by the external electrodes 231 and 232 may be further reduced such that capacitance per unit volume of the multilayer electronic component 2000 may increase.

The connection electrodes 231 a and 232 a may extend to a corner of the body 110 and may include a corner portion disposed on the corner. That is, in an example embodiment, the first connection electrode may include a corner portion (not illustrated) extending to the 1-3 corner and the 2-3 corner, and the second connection electrode may include a corner portion (not illustrated) extending to the 1-4 corner and the 2-4 corner.

Also, the connection electrodes 231 a and 232 a may have a uniform and reduced thickness as compared to the external electrodes formed by a general dipping method.

The method of forming the connection electrodes 231 a and 232 a is not limited to any particular example, and for example, the connection electrodes 231 a and 232 a may be formed by a method of transferring a sheet including a conductive metal or an organic material such as a binder to the third and fourth surfaces, but an example embodiment thereof is not limited thereto, and connection electrodes 231 a and 232 a may be formed by plating a conductive metal on the third and fourth surfaces. That is, the connection electrodes 231 a and 232 a may be a fired layer formed by firing a conductive metal or a plating layer.

The thickness of the connection electrodes 231 a and 232 a is not limited to any particular example, and may be, for example, 2 to 7 μm. Here, the thickness of the connection electrodes 231 a and 232 a may indicate the maximum thickness, and may indicate the size of the connection electrodes 231 a and 232 a in the second direction.

In an example embodiment, the first and second connection electrodes 231 a and 232 a may include a metal and glass the same as those included in the internal electrodes 121 and 122. As the first and second connection electrodes 231 a and 232 a include the same metal as the metal included in the internal electrodes 121 and 122, electrical connectivity with the internal electrodes 121 and 122 may improve, and as the first and second connection electrodes 231 a and 232 a include glass, bonding strength with the body 110 and/or the insulating layers 251 and 252 may improve. In this case, the same metal as the metal included in the internal electrodes 121 and 122 may be Ni.

The first and second insulating layers 251 and 252 may be disposed on the first and second connection electrodes 231 a and 232 a and may prevent a plating layer from being formed on the first and second connection electrodes 231 a and 232 a. Also, the first and second insulating layers 251 and 252 may improve sealing properties, thereby reducing permeation of moisture or a plating solution.

In an example embodiment, the first and second insulating layers 251 and 252 may include an oxide including silicon (Si). Accordingly, moisture resistance reliability may improve, and cracks due to heat shrinkage and radiation cracks due to metal diffusion may be prevented.

In this case, in an example embodiment, the first and second insulating layers 251 and 252 may further include an oxide including boron, and an adhesive layer including barium and boron may be further provided on an interfacial surface between the first and second insulating layers 251 and 252 and the body 110, such that adhesion force between the insulating layers 251 and 252 and the body 110 may improve, and the overall strength of the multilayer electronic component 2000 may improve.

In an example embodiment, in the first and second insulating layers 251 and 252, the number of moles of Si atoms based on the number of moles of elements other than oxygen may be 0.95 or more. That is, the insulating layer 151 may be formed of an oxide including Si substantially other than elements detected as impurities, and accordingly, permeation of external moisture may be effectively prevented as compared to the insulating layer including different components and having the same thickness, and corrosion resistance and resistance against acids or bases such as a plating solution may improve.

Also, in an example embodiment, the first and second insulating layers 251 and 252 may include at least one or more of an oxide including boron, borosilicate, and zinc-borosilicate. Accordingly, by reducing stress applied to the multilayer electronic component 2000 from external thermal impact, cracks and delamination may be reduced, radiation cracks may be prevented, and permeation of a plating solution and external moisture may be prevented such that reliability of the multilayer electronic component 2000 may improve.

In the aforementioned example embodiments, the first and second insulating layers 251 and 252 include at least one or more of boric oxide, borosilicate, and zinc-borosilicate, the material may react with barium oxide on the surface of the body 110 at a low temperature and eutectic may be formed. Accordingly, in an example embodiment, the multilayer electronic component 2000 may further include an adhesive layer including barium and boron at an interfacial surface between the insulating layers 251 and 252 further including an oxide including boron and the body 110.

Since the material included in the insulating layer is an insulating material such as SiO₂ and B₂O₃, adhesion force with the first and second external electrodes 131 and 132 including the conductive metal may not be good. In the multilayer electronic component 2000 in an example embodiment, although adhesion force between the insulating layer 251 and 252 and the first and second external electrodes 231 and 232 is not good, adhesion force with the body 110 including the insulating material may be good, such that overall strength of the multilayer electronic component 2000 may improve.

The first and second band electrodes 231 b and 232 b may be disposed on the first surface 1 of the body 110. The first and second band electrodes 231 b and 232 b may be electrically connected to the first and second internal electrodes 121 and 122 by being in contact with the first and second connection electrodes 231 a and 232 a, respectively.

A thickness of the external electrode formed by a general dipping method may be formed to be relatively great on the third and fourth surfaces and may partially extend to the first, second, fifth and sixth surfaces, such that it may be difficult to secure a high effective volume ratio.

In an example embodiment, the first and second connection electrodes 231 a and 232 a may be disposed on the surface on which the internal electrode is exposed, and the first and second band 231 b and 232 b may be disposed on the surface of the substrate, such that a high effective volume ratio may be secured.

When the internal electrodes 121 and 122 are laminated in the first direction, the multilayer electronic component 2000 may be horizontally mounted on a substrate such that the internal electrodes 121 and 122 may be parallel to the mounting surface. However, an example embodiment thereof is not limited to the horizontal mounting, and when the internal electrodes 121 and 122 are laminated in the third direction, the multilayer electronic component may be vertically mounted on the substrate such that the internal electrodes 121 and 122 may be perpendicular to the mounting surface.

The first and second band electrodes 231 b and 232 b may be formed of any material having electrical conductivity, such as metal, and a specific material may be determined in consideration of electrical properties and structural stability. For example, the first and second band electrodes 231 b and 232 b may be fired electrodes including conductive metal and glass, and may be formed by applying paste including conductive metal and glass to the first surface of the body, but an example embodiment thereof is not limited thereto, and the first and second band electrodes 231 b and 232 b may be plating layers formed by plating a conductive metal on the first surface of the body.

A material having excellent electrical conductivity may be used as the conductive metal included in the first and second band electrodes 231 b and 232 b, and the material is not limited to any particular example. For example, the conductive metal may be one or more of nickel (Ni), copper (Cu), and alloys thereof, and may include the same metal as the metal included in the internal electrodes 121 and 122.

In an example embodiment, to secure sealing properties and high strength, the first external electrode 231 may include a third band electrode (not illustrated) disposed on the second surface 2 and connected to the first connection electrode 231 a, and the second external electrode 232 may include a fourth band electrode (not illustrated) disposed on the second surface 2 and connected to the second connection electrode 232 a.

In an example embodiment, the distance from an extension line E3 of the third surface to an end of the first band electrode 231 b is defined as B1, the distance from an extension line E4 of the fourth surface 232 b to an end of the second band electrode 232 b is defined as B2, a distance from an extension line of the third surface to an end of the third band electrode (not illustrated) is defined as B3, a distance from an extension line of the fourth surface to an end of the fourth band electrode (not illustrated) is defined as B4, an average size of the region in which the third surface and the second internal electrode 122 are spaced apart from each other, taken in the second direction, is defined as G1, and an average size of the region in which the fourth surface and the first internal electrode 121 are spaced apart from each other, taken in the second direction, is defined as G2, B1≥G1, B3≤G1, B2≥G2 and B4≤G2 may be satisfied. Accordingly, the volume occupied by the external electrode may be reduced, such that capacitance per unit volume of the multilayer electronic component 2000 may increase and the area in contact with solder during mounting may increase, thereby improving bonding force.

However, an example embodiment thereof is not limited to B1≥G1, B3≤G1, B2≥G2 and B4≤G2, and the example in which B1≥G1, B3≥G1, B2≥G2 and B4≥G2 are satisfied may be included in the example embodiment. Accordingly, in an example embodiment, the distance B1 from an extension line E3 of the third surface to an end of the first band electrode 231 b is defined as B1, the distance from the extension line E4 of the fourth surface to the end of the second band electrode 232 b is defined as B2, the distance from the extension line of the third surface to the end of the third band electrode (not illustrated) is defined as B3, the distance from the extension line of the fourth surface to the end of the fourth band electrode (not illustrated) is defined as B4, and the average size of the region in which the third surface and the second internal electrode 122 are spaced apart from each other, taken in the second direction, is defined as G1, and the average size of the region in which the fourth surface and the first internal electrode 121 are spaced apart from each other, taken in the second direction, is defined as G2, B1≥G1, B3≥G1, B2≥G2 and B4≥G2 may be satisfied.

The first and second plating layers 241 and 242 may be disposed on the first and second band electrodes 231 b and 232 b. The first and second plating layers 241 and 242 may improve mounting properties. The types of the first and second plating layers 241 and 242 are not limited to any particular example, and may be a plating layer including at least one of Ni, Sn, Pd, and alloys thereof, and may include a plurality of layers.

For example, the first and second plating layers 241 and 242 may be a Ni plating layer or a Sn plating layer, and the Ni plating layer and the Sn plating layer may be formed in order on the first and second band electrodes 231 b and 232 b.

In an example embodiment, the first and second plating layers 241 and 242 may extend to partially cover the first and second connection electrodes 231 a and 232 a, respectively.

When an average distance in the first direction from the first surface 1 to the internal electrode disposed most adjacent (closest) to the first surface 1 among the first and second internal electrodes 121 and 122 is defined as H1, and an average distance in the first direction from an extension line of the first surface 1 to an ends of the first and second plating layers 241 and 242 disposed on the first and second connection electrodes 231 a and 232 a is defined as H2, H1>H2 may be satisfied. Accordingly, permeation of the plating solution into the internal electrode during the plating process may be prevented, thereby improving reliability.

In an example embodiment, the first and second insulating layers 251 and 252 may be disposed to be in direct contact with the first and second connection electrodes 231 a and 232 a, respectively, and the first and second connection electrodes 231 a and 232 a may include conductive metal and glass. Accordingly, since the plating layers 241 and 242 may not be disposed on the regions in which the insulating layers 251 and 252 are disposed among the exterior surfaces of the first and second connection electrodes 231 a and 232 a, erosion of the external electrodes caused by the plating solution may be effectively prevented.

In an example embodiment, the first and second insulating layers 251 and 252 may be disposed to be in direct contact with the first and second connection electrodes 231 a and 232 a, respectively, and the first and second connection electrodes 231 a and 232 a may include conductive metal and glass. Accordingly, since the plating layers 241 and 242 may not be disposed on the regions in which the insulating layers 251 and 252 are disposed among the exterior surfaces of the first and second connection electrodes 231 a and 232 a, erosion of the external electrodes caused by the plating solution may be effectively prevented.

In an example embodiment, the first plating layer 241 may be disposed to cover an end of the first insulating layer 251 disposed on the first external electrode 231, and the second plating layer 242 may be disposed to cover an end of the second insulating layer 252 disposed on the second external electrode 232. Accordingly, bonding force between the insulating layers 251 and 252 and the plating layers 241 and 242 may be strengthened, such that reliability of the multilayer electronic component 3000 may improve. Also, by first forming the first and second insulating layers 251 and 252 before forming the plating layers 241 and 242 on the external electrodes 231 and 232, permeation of the plating solution in the process of forming a plating layer may be reliably prevented. As the insulating layer is formed before the plating layer, the plating layers 241 and 242 may have a shape covering the ends of the insulating layers 251 and 252.

In an example embodiment, the first insulating layer 251 is disposed to cover the end of the first plating layer 241 disposed on the first external electrode 231, and the second insulating layer 252 may be disposed to cover an end of the second plating layer 342 disposed on the second external electrode 332. Accordingly, bonding force between the insulating layer 351 and the plating layers 341 and 342 may be strengthened, such that reliability of the multilayer electronic component 3000 may improve.

FIG. 21 is a diagram illustrating a modified example of the example in FIG. 19 . Referring to FIG. 21 , in the modified example 2001 of the multilayer electronic component 2000, the first and second insulating layers 251-1 and 252-1 may extend to the fifth and sixth surfaces 5 and 6 and may be connected to each other such that the insulating layers may be connected as an integrated insulating layer 253-1. In this case, the connected first and second insulating layers 253-1 may be disposed to cover portions of the fifth and sixth surfaces.

FIG. 22 is a perspective diagram illustrating a multilayer electronic component 2002 according to an example embodiment. FIG. 23 is a cross-sectional diagram taken along line IX-IX′ in FIG. 2 .

Referring to FIGS. 22 and 23 , in the multilayer electronic component 2002 in an example embodiment, the first and second plating layers 241-2 and 242-2 may be disposed to a region below the extension line of the first surface. Accordingly, a height of solder may be reduced during mounting and a mounting space may be reduced.

Also, the first and second insulating layers 251-2 and 252-2 may extend to a region below the extension line of the first surface and may be in contact with the first and second plating layers 241-2 and 242-2.

FIG. 24 is a diagram illustrating a modified example of the example in FIG. 22 . Referring to FIG. 24 , in the modified example 2003 of the multilayer electronic component 2002 in an example embodiment, the first and second insulating layers 251-3 and 252-3 may extend to the fifth and sixth surfaces 5 and 6 and may be connected to each other such that the insulating layers may be connected as an integrated insulating layer 253-3.

FIG. 25 is a perspective diagram illustrating a multilayer electronic component 2004 according to an example embodiment. FIG. 26 is a cross-sectional diagram taken along line X-X′ in FIG. 25 .

Referring to FIGS. 25 and 26 , the multilayer electronic component 2004 in an example embodiment may further include an additional insulating layer 261 disposed on the first surface 1 and disposed between the first band electrode 231 b and the second band electrode 232 b. Accordingly, a leakage current that may occur between the first band electrode 231 b and the second band electrode 232 b under a high voltage current may be prevented.

The type of the additional insulating layer 261 is not limited to any particular example. For example, the additional insulating layer 261 may include at least one of an oxide including Si, an oxide including boron, borosilicate, and zinc-borosilicate, similarly to the first and second insulating layers 251-2 and 252-2. The additional insulating layer 261 and the insulating layers 251-2 and 252-2 is not formed of the same material, and may be formed of different materials. For example, the additional insulating layer 261 may include at least one selected from an epoxy resin, an acrylic resin, ethyl cellulose, and the like, or glass.

FIG. 27 is a diagram illustrating a modified example of the example in FIG. 25 . Referring to FIG. 27 , in the modified example 2005 of the multilayer electronic component 2004, the first and second insulating layers 251-5 and 252-5 may extend to the fifth and sixth surfaces 5 and 6 and may be connected to each other such that the insulating layers may be connected as an integrated insulating layer 253-5.

FIG. 28 is a perspective diagram illustrating a multilayer electronic component 2006 according to an example embodiment. FIG. 29 is a cross-sectional diagram taken along line XI-XI′ in FIG. 28 .

Referring to FIGS. 28 and 29 , the multilayer electronic component 2006 according to an example embodiment may include a first insulating layer 251-6 disposed on a first connection electrode 231 a and a second insulating layer 252-6 disposed on a second connection electrode 232 a. When an average distance in the first direction from the first surface 1 to an internal electrode disposed most adjacent (closest) to the first surface 1 among the first and second internal electrodes 121 and 122 is defined as H1, and an average distance in the first direction from an extension line of the first surface 1 to ends of the first and second plating layers 241-6 and 242-6 disposed on the first and second connection electrodes 231 a and 232 a is defined as H2, H1<H2 may be satisfied. Accordingly, the area in contact with the solder during mounting may increase, thereby improving bonding force.

More preferably, when the average size of the body 110 in the first direction is defined as T, H2<T/2 may be satisfied. That is, H1<H2<T/2 may be satisfied, which may be because the effect of improving moisture resistance reliability by an insulating layer may degrade when H2 is T/2 or more.

FIG. 30 is a diagram illustrating a modified example of the example in FIG. 28 . Referring to FIG. 30 , in the modified example 2007 of the multilayer electronic component 2006, the first and second insulating layers 251-7 and 252-7 may extend to the fifth and sixth surfaces 5 and 6 and may be connected to each other such that the insulating layers may be connected as an integrated insulating layer 253-7.

FIG. 31 is a perspective diagram illustrating a multilayer electronic component 2008 according to an example embodiment. FIG. 32 is a cross-sectional diagram taken along line XII-XII′ in FIG. 31 .

Referring to FIGS. 31 and 32 , in the multilayer electronic component 2008 in an example embodiment, the first and second insulating layers 251-8 and 252-8 may extend to the second, fifth and sixth surfaces 2, 5 and 6 and may be connected to each other such that the insulating layers may be connected as an integrated insulating layer 253-8. As illustrated in FIG. 33 , the insulating layer 253-8 may cover an entirety of the second surface, and the fifth and sixth surfaces may partially cover the second surface.

FIG. 33 is a perspective diagram illustrating a multilayer electronic component 2009 according to an example embodiment. FIG. 34 is a cross-sectional diagram taken along line XIII-XIII′ in FIG. 33 .

Referring to FIGS. 33 and 34 , an average thickness t1 of the first and second plating layers 241-9 and 242-9 of the multilayer electronic component 2009 in an example embodiment may be less than an average thickness t2 of the first and second insulating layers 251-9 and 252-9.

In an example embodiment, the average thickness t1 of the first and second plating layers 241-9 and 242-9 may be reduced to be less than the average thickness t2 of the first and second insulating layers 251-9 and 252-9 such that the contact area between the plating layer and the insulating layer may be reduced. Accordingly, delamination may be prevented and bonding force of the multilayer electronic component 2009 with the substrate 180 may improve.

The average thickness t1 of the first and second plating layers 241-9 and 242-9 may be an average value of thicknesses measured at five points, spaced apart by an equal distance, on the first and second connection electrodes 231 a and 232 a or the first and second band electrodes 231 b and 232 b. The average thickness t2 of the insulating layers 251-9 and 252-9 may be an average value of thicknesses measured at five points, spaced apart by an equal distance, on the first and second connection electrodes 231 a and 232 a. For example, the measurements may be taken by scanning the cross-section of the body 110 using a scanning electron microscope (SEM). Other methods and/or tools appreciated by one of ordinary skill in the art, even if not described in the present disclosure, may also be used.

FIG. 35 is a diagram illustrating a modified example of the example in FIG. 33 . Referring to FIG. 35 , in the modified example 2010 of the multilayer electronic component 2009 in an example embodiment, the first and second insulating layers 251-10 and 252-10 may extend to the fifth and sixth surfaces 5 and 6 and may be connected to each other, such that the insulating layers may be connected as an integrated insulating layer 253-10.

FIG. 36 is a perspective diagram illustrating a multilayer electronic component 3000 according to an example embodiment. FIG. 37 is a cross-sectional diagram taken along line XIV-XIV′ in FIG. 36 . FIG. 38 is an enlarged diagram illustrating region K1 in FIG. 36 .

Referring to FIGS. 36 to 38 , in the multilayer electronic component 3000 in an example embodiment may include a dielectric layer 111 and first and second internal electrodes 121 and 122 alternately disposed with the dielectric layer interposed therebetween and may further include a body 110 including first and second surfaces 1 and 2 opposing each other in the first direction, third and fourth surfaces 3 and 4 connected to the first and second surfaces 1 and 2 and opposing in the second direction, and fifth and sixth surfaces 5 and 6 connected to the first and second surfaces 1 and 2 and the third and fourth surfaces 3 and 4 and opposing each other in the third direction; a first external electrode 331 including a first connection portion 331 a disposed on the third surface of the body, a first band portion 331 b extending from the first connection portion to a portion of the first surface, and a first corner portion 331 c extending from the first connection portion to a corner connecting the second and third surfaces of the body to each other; a second external electrode 332 including a second connection portion 332 a disposed on the fourth surface of the body, a second band portion 332 b extending from the second connection portion to a portion of the first surface, and a second corner portion 332 c extending from the second connection portion to a corner connecting the second and fourth surfaces of the body to each other; an insulating layer 351 disposed on the first and second connection portions 331 a and 332 a and covering the second surface and the first and second corner portions; a first plating layer 341 disposed on the first band portion; and a second plating layer 342 disposed on the second band portion, wherein the first and second insulating layers may include an oxide including silicon (Si).

In an example embodiment, when an average distance in the second direction from an extension line of the third surface to an end of the first corner portion 331 c is defined as B3, an average distance in the second direction from an extension line of the fourth surface to an end of the second corner portion 332 c is defined as B4, the average size of the region in which the third surface and the second internal electrode are spaced apart from each other, taken in the second direction, is defined as G1, and an average size of the region in which the fourth surface and the first internal electrode are spaced apart from each other, taken in the second direction, is defined as G2, B3≤G1 and B4≤G2 may be satisfied. Accordingly, the volume occupied by the external electrodes 331 and 332 may be reduced, such that capacitance per unit volume of the multilayer electronic component 3000 may be increased.

In this case, when the average distance in the second direction from an extension line of the third surface to an end of the first band portion 331 b is defined as B1, and the average size from the extension line of the fourth surface to an end of the second band portion 332 b is defined as B2, B1≥G1 and B3≥G2 may be satisfied. Accordingly, the area in contact with the solder during mounting may increase, such that bonding force may improve.

The multilayer electronic component 3000 according to an example embodiment may include a dielectric layer 111 and first and second internal electrodes 121 and 122 alternately disposed with the dielectric layer interposed therebetween, and may further include a body 110 including first and second surfaces 1 and 2 opposing each other in the first direction, third and fourth surfaces 3 and 4 connected to the first and second surfaces 1 and 2 and opposing in the second direction, and fifth and sixth surfaces 5 and 6 connected to the first and second surfaces 1 and 2 and the third and fourth surfaces 3 and 4 and opposing each other in the third direction. The body 110 of the multilayer electronic component 3000 may have the same configuration as that of the body of the multilayer electronic component 1000 other than the configuration in which the ends of the first or second surface of the body has a reduced shape.

The external electrodes 331 and 332 may be disposed on the third surface 3 and the fourth surface 4 of the body 110. The external electrodes 331 and 332 may include the first and second external electrodes 331 and 332 disposed on the third and fourth surfaces 3 and 4 of the body 110, respectively, and connected to the first and second internal electrodes 121 and 122, respectively.

The external electrodes 331 and 332 may include a first external electrode 331 including a first connection portion 331 a disposed on a third surface, a first band portion 331 b extending from the first connection portion to a portion of the first surface, and a first corner portion 331 c extending from the first connection portion to a corner connecting the second surface and the third surface to each other, and a second external electrode 132 including a second connection portion 332 a disposed on the fourth surface, a second band portion 332 b extending from the second connection portion to a portion of the first surface, and a second corner portion 332 c extending from the second connection portion to a corner connecting the second and fourth surfaces to each other. The first connection portion 331 a may be connected to the first internal electrode 121 on the third surface, and the second connection portion 332 a may be connected to the second internal electrode 122 on the fourth surface.

In an example embodiment, the first and second connection portions 331 a and 332 a may be spaced apart from the fifth and sixth surfaces. Accordingly, the volume of the external electrodes 331 and 332 may be reduced, thereby reducing the size of the multilayer electronic component 3000.

As the margin region in which the internal electrodes 121 and 122 is not disposed overlaps the dielectric layer 111, a step difference may be formed due to the thickness of the internal electrodes 121 and 122, such that the corner connecting the first surface to the third to sixth surfaces and/or the corner connecting the second surface to the third to sixth surfaces may have a contracted shape in a direction of a center of the body 110 in the first direction with respect to the first surface or the second surface. Alternatively, the corner connecting the first surface 1 to the third to sixth surfaces 3, 4, 5, 6 and/or the corner connecting the second surface 2 to the third to sixth surfaces 3, 4, 5, and 6 may have a contracted shape in a direction of a center of the body 110 in the first direction with respect to the first surface or the second surface. Alternatively, as a separate process is performed to round the corners connecting the surfaces of the body 110 to prevent chipping defects, the corners connecting the first and third to sixth surfaces and/or the corner connecting the second surface and the third to sixth surfaces may have a rounded shape.

The corner may include a 1-3 corner c1-3 connecting the first surface and the third surface, a 1-4 corner c1-4 connecting the first surface and the fourth surface, a 2-3 corner c2-3 connecting the second surface and the third surface, and a 2-4 corner c2-4 connecting the second surface and the fourth surface. Also, the corners may include a 1-5 corner connecting the first and fifth surfaces, a 1-6 corner connecting the first and sixth surfaces, a 2-5 corner connecting the second and fifth surfaces, and a 2-6 corner connecting the second surface and the sixth surface. However, to prevent the step difference due to the internal electrodes 121 and 122, after lamination, when the internal electrodes may be cut to be exposed to the fifth and sixth surfaces 5 and 6 of the body, and a single dielectric layer or two or more dielectric layers may be laminated on both side surfaces of the capacitance formation portion Ac in the third direction (the width direction) to form the margin portions 114 and 115, the portion connecting the first surface to the fifth and sixth surfaces and the portion connecting the second surface to the fifth and sixth surfaces may not have a contracted shape.

The first to sixth surfaces of the body 110 may be almost flat surfaces, and non-flat regions may be viewed as corners. Also, a region disposed on a corner among the external electrodes 131 and 132 may be viewed as a corner portion.

In this regard, the first and second corner portions 331 c and 332 c may be disposed below the extension line E2 of the second surface, and the first and second corner portions 331 c and 332 c may be spaced apart from the second surface. That is, since the external electrodes 331 and 332 are not disposed on the second surface, the volume occupied by the external electrodes 331 and 332 may be further reduced, thereby increasing capacitance per unit volume of the multilayer electronic component 3000. Also, the first corner portion 331 c may be disposed on a portion of a 2-3 corner C2-3 connecting the third surface and the second surface, and the second corner portion 332 c may be formed on a portion of the 2-4 corner C2-4 connecting the fourth surface and the second surface.

The extension line E2 of the second surface may be defined as below.

Seven linear lines P0, P1, P2, P3, P4, P5, P6, and P7 spaced apart by an equal distance in the thickness direction may be drawn in the length direction from the third surface to the fourth surface on the length-thickness cross-section (L-T cross-section) in a center in the width direction, and the line crossing the point at which P2 meets the second surface and the point at which P4 meets the second surface may be defined as the extension line E2 of the second surface.

The external electrodes 331 and 332 may be formed using any material having electrical conductivity, such as metal, and a specific material may be determined in consideration of electrical properties and structural stability, and the external electrodes 331 and 332 may have a multilayer structure.

The external electrodes 331 and 332 may be a fired electrode including a conductive metal and glass, or a resin-based electrode including a conductive metal and a resin.

Also, the external electrodes 331 and 332 may have a form in which a plastic electrode and a resin-based electrode may be formed in order on the body. Also, the external electrodes 331 and 332 may be formed by transferring a sheet including the conductive metal to the body or by transferring a sheet including a conductive metal to the fired electrode.

As the conductive metal included in the external electrodes 331 and 332, a material having excellent electrical conductivity may be used, and the material is not limited to any particular example. For example, the conductive metal may be one or more of Cu, Ni, Pd, Ag, Sn, Cr, and alloys thereof. Preferably, the external electrodes 331 and 332 may include at least one of Ni and a Ni alloy, and accordingly, connectivity with the internal electrodes 121 and 122 including Ni may improve.

The insulating layer 351 may be disposed on the first and second connection portions 331 a and 332 a.

Since the first and second connection portions 331 a and 332 a may be connected to the internal electrodes 121 and 122, the first and second connection portions 331 a and 332 a may be paths for permeation of a plating solution in a plating process or moisture permeation during actual use. In the example embodiment, since the insulating layer 351 is disposed on the connection portions 331 a and 332 a, permeation of external moisture or a plating solution may be prevented.

The insulating layer 351 may be disposed to be in contact with the first and second plating layers 341 and 342. In this case, the insulating layer 351 may be in contact with the ends of the first and second plating layers 341 and 342 by partially covering the ends, or the first and second plating layers 341 and 342 may be in contact with the ends of the insulating layer 351 by partially covering the ends.

The insulating layer 353 may be disposed on the first and second connection portions 331 a and 332 a, and may be disposed to cover the second surface and the first and second corner portions 331 c and 332 c. Also, the insulating layer 351 may cover the region in which the ends of the first and second corner portions 331 c and 332 c are in contact with the body 110 and may block the moisture permeation path, thereby improving moisture resistance reliability.

The insulating layer 351 may be disposed on the second surface and may extend to the first and second connection portions 331 a and 332 a. Also, when the external electrodes 331 and 332 are not disposed on the second surface, the insulating layer may be disposed to entirely cover the second surface. The insulating layer 351 may not necessarily have to be disposed on the second surface, and the insulating layer may not be disposed on a portion or an entirety of the second surface, and the insulating layer may be divided into two regions and the two regions may be disposed on the first and second connection portions 331 a and 332 a, respectively. However, even in this case, the insulating layer may be disposed to entirely cover the first and second corner portions 331 c and 332 c. When the insulating layer is not disposed on an entirety of the second surface, the insulating layer may be disposed below an extension line of the second surface. Also, the insulating layer is not disposed on the second surface, and may extend from the first and second connection portions 331 a and 332 a to the fifth and sixth surfaces and may form an integrated insulating layer.

In an example embodiment, the insulating layer 351 may be disposed to cover portions of the fifth and sixth surfaces and may improve reliability. In this case, portions of the fifth and sixth surfaces not covered by the insulating layer may be exposed.

Further, the insulating layer 351 may be disposed to cover an entirety of the fifth and sixth surfaces, and in this case, the fifth and sixth surfaces may not be exposed, thereby improving moisture resistance reliability.

The insulating layer 351 may prevent the plating layers 341 and 342 from being formed on the external electrodes 331 and 332 on which the insulating layer 351 is disposed, and may improve sealing properties and may reduce permeation of moisture or a plating solution. The components, composition, average thickness, and effects of the insulating layer 351 may be the same as the insulating layers 151, 251, 252, and 253 included in the multilayer electronic components 1000 and 2000 and various embodiments thereof, and accordingly, the descriptions thereof will not be provided.

The first and second plating layers 341 and 342 may be disposed on the first and second band portions 331 b and 332 b, respectively. The plating layers 341 and 342 may improve mounting properties, and as the plating layers 341 and 342 are disposed on the band portions 331 b and 332 b, the mounting space may be reduced, and permeation of a plating solution into the internal electrode may be reduced, thereby improving reliability. One end of the first and second plating layers 341 and 342 may be in contact with the first surface, and the other ends may be in contact with the insulating layer 351.

The type of the plating layers 341 and 342 is not limited to any particular example, and may be a plating layer including at least one of Cu, Ni, Sn, Ag, Au, Pd, and alloys thereof, and may include a plurality of layers.

For example, the plating layers 341 and 342 may be a Ni plating layer or a Sn plating layer, and a Ni plating layer and the Sn plating layer and the Ni plating layer may be formed in order on the first and second band portions 331 b and 332 b.

In an example embodiment, the insulating layer 351 may be disposed to be in direct contact with the first and second external electrodes 331 and 332, and the first and second external electrodes 331 and 332 may include a conductive metal and glass. Accordingly, since the plating layers 341 and 342 may not be disposed in the region in which the insulating layer 351 is disposed among the external surfaces of the first and second external electrodes 331 and 332, erosion of the external electrodes caused by the plating solution may be effectively prevented.

In an example embodiment, the insulating layer 351 may be disposed to be in direct contact with the first and second external electrodes 331 and 332, and the first and second external electrodes 331 and 332 may include a conductive metal and glass. Accordingly, since the plating layers 341 and 342 may not be disposed in the region in which the insulating layer 351 is disposed among the external surfaces of the first and second external electrodes 331 and 332, erosion of the external electrodes caused by the plating solution may be effectively prevented.

In an example embodiment, the first plating layer 341 may be disposed to cover an end of the insulating layer 351 disposed on the first external electrode 331, and the second plating layer 342 may be disposed to cover an end of the insulating layer 351 disposed on the second external electrode 332. Accordingly, bonding force between the insulating layer 351 and the plating layers 341 and 342 may be strengthened, such that reliability of the multilayer electronic component 3000 may improve. Also, by first forming the insulating layer 351 before forming the plating layers 241 and 242 on the external electrodes 331 and 332, permeation of the plating solution in the process of forming a plating layer may be reliably prevented. As the insulating layer is formed before the plating layer, the plating layers 341 and 342 may have a shape covering the end of the insulating layer 351.

In an example embodiment, the insulating layer 351 may be disposed to cover the end of the first plating layer 341 disposed on the first external electrode 331, and the insulating layer 352 may be disposed to cover an end of the second plating layer 342 disposed on the second external electrode 332. Accordingly, bonding force between the insulating layer 351 and the plating layers 341 and 342 may be strengthened, such that reliability of the multilayer electronic component 3000 may improve.

In an example embodiment, the first and second plating layers 341 and 342 may be extended to partially cover the first and second connection portions 331 a and 332 a, respectively. When an average distance in the first direction from the first surface 1 to an internal electrode disposed most adjacent (closest) to the first surface 1 among the internal electrodes 121 and 122 is defined as H1, and an average distance in the first direction from an extension line of the first surface 1 to ends of the plating layers 141 and 142 disposed on the first and second connection portions 131 a and 132 a is defined as H2, H1>H2 may be satisfied. Accordingly, permeation of the plating solution into the internal electrode during the plating process may be prevented, thereby improving reliability.

In an example embodiment, when an average distance in the first direction from the first surface 1 to an internal electrode disposed most adjacent (closest) to the first surface 1 among the internal electrodes 121 and 122 is defined as H1, and an average distance in the first direction from an extension line of the first surface 1 to ends of the plating layers 341 and 342 disposed on the first and second connection portions 331 a and 332 a is defined as H2, H1<H2 may be satisfied. Accordingly, the area in contact with the solder during mounting may increase, thereby improving bonding force. More preferably, when the average size of the body 110 in the first direction is defined as T, H2<T/2 may be satisfied. That is, H1<H2<T/2 may be satisfied, which may be because, when H2 is T/2 or more, the effect of improving moisture resistance reliability by the insulating layer may degrade.

In an example embodiment, the first and second plating layers 341 and 342 may be disposed below an extension line of the first surface. Accordingly, the height of the solder may be reduced during mounting and the mounting space may be reduced. Also, the insulating layer 351 may extend to a region below the extension line of the first surface and may be in contact with the first and second plating layers 341 and 342.

In an example embodiment, the average size of the body in the second direction is defined as L, the average distance in the second direction from an extension line of the third surface to an end of the first band portion is defined as B1, the average size of the body in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, 0.2≤B1/L≤0.4 and 0.2≤B2/L≤0.4 may be satisfied.

When B1/L and B2/L are less than 0.2, it may be difficult to secure sufficient fixing strength. When B2/L is greater than 0.4, a leakage current may be generated between the first band portion 331 b and the second band portion 332 b under a high-voltage current, and the first band portion 331 b and the second band portion 332 b may be electrically connected due to plating spread.

In an example embodiment, an additional insulating layer disposed on the first surface and disposed between the first band portion 331 b and the second band portion 332 b may be further included. Accordingly, a leakage current which may occur between the first band portion 331 b and the second band portion 332 b under a high voltage current may be prevented.

The type of the additional insulating layer is not limited to any particular example. For example, the additional insulating layer may include at least one of an oxide including Si, an oxide including boron, borosilicate, and zinc-borosilicate, similarly to the insulating layer 351. The additional insulating layer and the insulating layer 351 is not formed of the same material, but may be formed of different materials. For example, the additional insulating layer may include one or more selected from epoxy resin, acrylic resin, ethyl cellulose, and the like, or may include glass.

In an example embodiment, when the average distance in the second direction from an extension line of the third surface to an end of the first band portion is defined as B1, and the average distance in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, B3<B1 and B4<B2 may be satisfied. The average length B1 of the first band portion 331 b may be longer than the average length B3 of the first corner portion 331 c, and the average length of the second band portion 332 b may be longer than the average length B4 of the second corner portion 332 c. Accordingly, the region in contact with the solder during mounting may increase, thereby improving bonding force.

In greater detail, when the average distance in the second direction from an extension line of the third surface 3 to an end of the first band portion 331 b is defined as B1, the average distance in the second direction from an extension line of the fourth surface 4 to an end of the second band portion 332 b is defined as B2, the average distance in the second direction from an extension line of the third surface 3 to an end of the first corner portion 331 c is defined as B3, and the average distance in the second direction from an extension line of the fourth surface 4 to an end of the second corner portion 332 c is defined as B4, B3<B1 and B4<B2 may be satisfied.

In an example embodiment, an average thickness of the first and second plating layers 341 and 342 may be less than an average thickness of the insulating layer 351.

The insulating layer 351 may prevent permeation of external moisture or the plating solution, but connectivity with the plating layers 341 and 342 may be relatively weak, which may cause delamination of the plating layer. When the plating layer is delaminated, bonding force with the substrate may be reduced. Here, the delamination of the plating layer may refer to separation of a portion of the plating layer or physical separation of the plating layer from the external electrodes 331 and 332. Since the connection between the plated layer and the insulating layer is relatively weak, it may be highly likely that a gap between the insulating layer and the plated layer may be widened or foreign substances may enter, and the possibility of delamination may increase due to vulnerability to external impacts.

In an example embodiment, by reducing the average thickness of the plated layer to be less than the average thickness of the insulating layer, the contact area between the plated layer and the insulating layer may be reduced, thereby preventing delamination and improving bonding force of the multilayer electronic component 3000 with the components.

The size of the multilayer electronic component 3000 is not limited to any particular example.

However, to obtain both miniaturization and high capacitance, it may be necessary to increase the number of laminated layers by reducing the thicknesses of the dielectric layer and the internal electrode, and accordingly, in the multilayer electronic component 3000 having a size of 1005 (length×width, 1.0 mm×0.5 mm) or less, the effect of improving reliability and capacitance per unit volume in the example embodiment may be distinct.

Accordingly, when manufacturing errors, external electrode sizes, or the like are considered, and when the length of the multilayer electronic component 3000 is 1.1 mm or less and the width is 0.55 mm or less, the effect of improving reliability in the example embodiment may be distinct. Here, the length of the multilayer electronic component 3000 may refer to the maximum size of the multilayer electronic component 3000 in the second direction, and the width of the multilayer electronic component 3000 may refer to the maximum size of the multilayer electronic component 3000 in the third direction.

According to the aforementioned example embodiments, the multilayer electronic component may be protected from thermal expansion and thermal reduction and a uniform insulating film may be formed.

Also, by suppressing transmission of stress to the multilayer electronic component while hardness of the glass layer increases at a temperature below the softening point, cracks and delamination may be prevented in the multilayer electronic component.

Also, radiation cracks caused by diffusion of the metal of the external electrode included in the multilayer electronic component into the internal electrode in the process of raising the temperature may be prevented.

While example embodiments have been illustrated and described above, it will be apparent to those skilled in the art that modifications and variations could be made without departing from the scope in the example embodiment as defined by the appended claims. 

1. A multilayer electronic component, comprising: a body including a dielectric layer and first and second internal electrodes alternately disposed with the dielectric layer interposed therebetween, and including first and second surfaces opposing each other in a first direction, third and fourth surfaces connected to the first and second surfaces and opposing each other in a second direction, and fifth and sixth surfaces connected to the first to fourth surfaces and opposing each other a third direction; a first external electrode including a first connection portion disposed on the third surface, and a first band portion extending from the first connection portion to a portion of the first surface; a second external electrode including a second connection portion disposed on the fourth surface, and a second band portion extending from the second connection portion to a portion of the first surface; an insulating layer disposed on the second surface and extending to the first and second connection portions; a first plating layer disposed on the first band portion; and a second plating layer disposed on the second band portion, wherein the insulating layer includes an oxide including silicon (Si).
 2. The multilayer electronic component of claim 1, wherein the oxide including silicon (Si) is silica (SiO2).
 3. The multilayer electronic component of claim 1, wherein the insulating layer further includes an oxide including boron (B).
 4. The multilayer electronic component of claim 3, further comprising an adhesive layer including barium (Ba) and boron (B) disposed on an interfacial surface between the insulating layer and the body, wherein the body further includes barium (Ba).
 5. The multilayer electronic component of claim 3, wherein, an average size of the body in the second direction is defined as L, an average distance in the second direction from an extension line of the third surface to an end of the first band portion is defined as B1, an average distance in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, and 0.2≤B1/L≤0.4 and 0.2≤B2/L≤0.4 are satisfied.
 6. The multilayer electronic component of claim 4, wherein, an average size of the body in the second direction is defined as L, an average distance in the second direction from an extension line of the third surface to an end of the first band portion is defined as B1, an average distance in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, and 0.2≤B1/L≤0.4 and 0.2≤B2/L≤0.4 are satisfied.
 7. The multilayer electronic component of claim 3, further comprising: an additional insulating layer disposed on the first surface and disposed between the first band portion and the second band portion.
 8. The multilayer electronic component of claim 4, further comprising: an additional insulating layer disposed on the first surface and disposed between the first band portion and the second band portion.
 9. The multilayer electronic component of claim 3, wherein, an average distance from the first surface to an internal electrode closest to the first surface in the first direction among the first and second internal electrodes is defined as H1, an average distance in the first direction from an extension line of the first surface to an end of a plating layer disposed on the first and second connection portions is defined as H2, and H1>H2 is satisfied.
 10. The multilayer electronic component of claim 4, wherein, an average distance of from the first surface to internal electrode closest to the first surface in the first direction among the first and second internal electrodes is defined as H1, an average distance in the first direction from an extension line of the first surface to an end of a plating layer disposed on the first and second connection portions is defined as H2, and H1>H2 is satisfied.
 11. The multilayer electronic component of claim 3, wherein, an average distance from the first surface to an internal electrode closest to the first surface in the first direction among the first and second internal electrodes is defined as H1, an average distance in the first direction from an extension line of the first surface to an end of a plating layer disposed on the first and second connection portions is defined as H2, and H1<H2 is satisfied.
 12. The multilayer electronic component of claim 4, wherein, an average distance from the first surface to an internal electrode closest to the first surface in the first direction among the first and second internal electrodes is defined as H1, an average distance in the first direction from an extension line of the first surface to an end of a plating layer disposed on the first and second connection portions is defined as H2, and H1<H2 is satisfied.
 13. The multilayer electronic component of claim 1, wherein, an average distance from the first surface to an internal electrode closest to the first surface in the first direction among the first and second internal electrodes is defined as H1, an average distance in the first direction from an extension line of the first surface to an end of a plating layer disposed on the first and second connection portions is defined as H2, and H1>H2 is satisfied.
 14. The multilayer electronic component of claim 1, wherein, an average distance from the first surface to an internal electrode closest to the first surface in the first direction among the first and second internal electrodes is defined as H1, an average distance in the first direction from an extension line of the first surface to an end of a plating layer disposed on the first and second connection portions is defined as H2, and H1<H2 is satisfied.
 15. The multilayer electronic component of claim 14, wherein, an average size of the body in the first direction is defined as T, and H2<T/2 is satisfied.
 16. The multilayer electronic component of claim 1, wherein the first and second plating layers are disposed below an extension line of the first surface.
 17. The multilayer electronic component of claim 1, wherein, an average size of the body in the second direction is defined as L, an average distance in the second direction from an extension line of the third surface to an end of the first band portion is defined as B1, an average distance in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, and 0.2≤B1/L≤0.4 and 0.2≤B2/L≤0.4 are satisfied.
 18. The multilayer electronic component of claim 1, further comprising: an additional insulating layer disposed on the first surface and disposed between the first band portion and the second band portion.
 19. The multilayer electronic component of claim 18, wherein the additional insulating layer includes an oxide including silicon (Si).
 20. The multilayer electronic component of claim 1, wherein the first and second external electrodes include at least one of Ni and a Ni alloy.
 21. The multilayer electronic component of claim 1, wherein a maximum size of the multilayer electronic component in the second direction is 1.1 mm or less, and a maximum size in the third direction is 0.55 mm or less.
 22. The multilayer electronic component of claim 1, wherein an average thickness of the dielectric layer is 0.35 μm or less.
 23. The multilayer electronic component of claim 1, wherein an average thickness of the first and second internal electrodes is 0.35 μm or less.
 24. The multilayer electronic component of claim 1, further comprising: a capacitance formation portion including the first and second internal electrodes alternately disposed with the dielectric layer interposed therebetween and a cover portion disposed on both end surfaces of the capacitance formation portion in the first direction, wherein an average size of the cover portion in the first direction is 15 μm or less.
 25. The multilayer electronic component of claim 1, wherein an average thickness of the first and second plating layers is less than an average thickness of the insulating layer.
 26. The multilayer electronic component of claim 1, wherein the first and second connection portions are spaced apart from the fifth and sixth surfaces.
 27. The multilayer electronic component of claim 1, wherein the first and second connection portions are spaced apart from the second surface.
 28. The multilayer electronic component of claim 1, wherein the first plating layer is disposed to cover an end of the insulating layer disposed on the first external electrode, and the second plating layer is disposed to cover an end of the insulating layer disposed on the second external electrode.
 29. The multilayer electronic component of claim 1, wherein the insulating layer is disposed to cover an end of the first plating layer disposed on the first external electrode, and the insulating layer is disposed to cover an end of the second plating layer disposed on the second external electrode.
 30. The multilayer electronic component of claim 1, wherein the insulating layer is disposed to cover a portion of the fifth surface and the sixth surface.
 31. The multilayer electronic component of claim 1, wherein the insulating layer is disposed to cover entireties of the fifth and sixth surfaces.
 32. The multilayer electronic component of claim 1, wherein the body includes a 1-3 corner connecting the first surface to the third surface, a 1-4 corner connecting the first surface to the fourth surface, a 2-3 corner connecting the second surface to the third surface, and a 2-4 corner connecting the second surface to the fourth surface, wherein the 1-3 corner and the 2-3 corner have a form contracted in a direction of a center of the body taken in the first direction toward the third surface, and the 1-4 corner and the 2-4 corner have a form contracted in a direction of the center of the body taken in the first direction toward the fourth surface, and wherein the first external electrode includes a corner portion disposed on the 1-3 corner and a corner portion extending from the first connection portion to the 2-3 corner, and the second external electrode includes a corner portion disposed on the 1-4 corner and a corner portion extending from the second connection portion to the 2-4 corner. 33.-55. (canceled)
 56. A multilayer electronic component, comprising: a body including a dielectric layer and first and second internal electrodes alternately disposed with the dielectric layer interposed therebetween, and including first and second surfaces opposing each other in a first direction, third and fourth surfaces connected to the first and second surfaces and opposing each other in a second direction, and fifth and sixth surfaces connected to the first to fourth surfaces and opposing each other a third direction; a first external electrode including a first connection portion disposed on the third surface, a first band portion extending from the first connection portion to a portion of the first surface, and a third band portion extending from the first connection portion to a portion of the second surface; a second external electrode including a second connection portion disposed on the fourth surface, a second band portion extending from the second connection portion to a portion of the first surface, and a fourth band portion extending from the second connection portion to a portion of the second surface; an insulating layer disposed on the first and second connection portions and covering the second surface and the third and fourth band portions; a first plating layer disposed on the first band portion; and a second plating layer disposed on the second band portion, wherein the insulating layer includes an oxide including silicon (Si).
 57. The multilayer electronic component of claim 56, wherein the oxide including silicon (Si) is silica (SiO2).
 58. The multilayer electronic component of claim 56, wherein the insulating layer further includes an oxide including boron (B).
 59. The multilayer electronic component of claim 58, further comprising an adhesive layer including barium (Ba) and boron (B) disposed on an interfacial surface between the insulating layer and the body, wherein the body further includes barium (Ba).
 60. The multilayer electronic component of claim 56, wherein, an average distance from the first surface to an internal electrode closest to the first surface in the first direction among the first and second internal electrodes is defined as H1, an average distance in the first direction from an extension line of the first surface to an end of a plating layer disposed on the first and second connection portions is defined as H2, and H1>H2 is satisfied.
 61. The multilayer electronic component of claim 56, wherein, an average distance from the first surface to an internal electrode closest to the first surface in the first direction among the first and second internal electrodes is defined as H1, an average distance in the first direction from an extension line of the first surface to an end of a plating layer disposed on the first and second connection portions is defined as H2, and H1<H2 is satisfied.
 62. The multilayer electronic component of claim 61, wherein, an average size of the body in the first direction is defined as T, and H2<T/2 is satisfied.
 63. The multilayer electronic component of claim 56, wherein the first and second plating layers are disposed below an extension line of the first surface.
 64. The multilayer electronic component of claim 56, wherein, an average size of the body in the second direction is defined as L, an average distance in the second direction from an extension line of the third surface to an end of the first band portion is defined as B1, an average distance in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, and 0.2≤B1/L≤0.4 and 0.2≤B2/L≤0.4 are satisfied.
 65. The multilayer electronic component of claim 56, further comprising: an additional insulating layer disposed on the first surface and disposed between the first band portion and the second band portion.
 66. The multilayer electronic component of claim 65, wherein the additional insulating layer includes an oxide including boron (B).
 67. The multilayer electronic component of claim 56, wherein the first and second external electrodes include at least one of Ni and a Ni alloy.
 68. The multilayer electronic component of claim 56, wherein, an average distance in the second direction from an extension line of the third surface to an end of the first band portion is defined as B1, an average distance in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, an average distance in the second direction from an extension line of the third surface to an end of the third band portion is defined as B3, an average distance in the second direction from an extension line of the fourth surface to an end of the fourth band portion is defined as B4, and B3<B1 and B4<B2 are satisfied.
 69. The multilayer electronic component of claim 56, wherein a maximum size of the multilayer electronic component in the second direction is 1.1 mm or less, and a maximum size in the third direction is 0.55 mm or less.
 70. The multilayer electronic component of claim 56, wherein an average thickness of the dielectric layer is 0.35 μm or less.
 71. The multilayer electronic component of claim 56, wherein an average thickness of the first and second internal electrodes is 0.35 μm or less.
 72. The multilayer electronic component of claim 56, further comprising: a capacitance formation portion including the first and second internal electrodes alternately disposed with the dielectric layer interposed therebetween and a cover portion disposed on both end surfaces of the capacitance formation portion in the first direction, wherein an average size of the cover portion in the first direction is 15 μm or less.
 73. The multilayer electronic component of claim 56, wherein an average thickness of at least one of the first and second plating layers is less than an average thickness of the insulating layer.
 74. The multilayer electronic component of claim 56, wherein the first plating layer covers an end of the insulating layer disposed on the first external electrode, and the second plating layer covers an end of the insulating layer disposed on the second external electrode.
 75. The multilayer electronic component of claim 56, wherein the insulating layer covers an end of the first plating layer disposed on the first external electrode, and the insulating layer covers an end of the second plating layer disposed on the second external electrode.
 76. The multilayer electronic component of claim 56, wherein wherein the first external electrode includes a first side band portion extending from the first connection portion to portions of the fifth and sixth surfaces, wherein the second external electrode includes a second side band portion extending from the second connection portion to portions of the fifth and sixth surfaces, and wherein a size of the first and second side band portions in the second direction increases toward the first surface.
 77. The multilayer electronic component of claim 56, wherein the first external electrode includes a first side band portion extending from the first connection portion to portions of the fifth and sixth surfaces, wherein the second external electrode includes a second side band portion extending from the second connection portion to portions of the fifth and sixth surfaces, and wherein the insulating layer is disposed to cover a portion of the first and second side band portions, the fifth surface and the sixth surface.
 78. The multilayer electronic component of claim 56, wherein the first external electrode includes a first side band portion extending from the first connection portion to portions of the fifth and sixth surfaces, wherein the second external electrode includes a second side band portion extending from the second connection portion to portions of the fifth and sixth surfaces, and wherein the insulating layer is disposed to cover the first and second side band portions and the fifth and sixth surfaces.
 79. The multilayer electronic component of claim 56, wherein, an average distance in the second direction from an extension line of the third surface to an end of the third band portion is defined as B3, an average distance in the second direction from an extension line of the fourth surface to an end of the fourth band portion is defined as B4, an average size of a region in which the third surface and the second internal electrode are spaced apart from each other, taken in the second direction, is defined as G1, an average size of a region in which the fourth surface and the first internal electrode are spaced apart from each other, taken in the second direction, is defined as G2, and B3≥G1 and B4≥G2 are satisfied.
 80. The multilayer electronic component of claim 56, wherein an average distance in the second direction from an extension line of the third surface to an end of the first band portion is defined as B1, and an average distance in the second direction from an extension line of the fourth surface to an end of the second band portion is defined as B2, B1≥G1 and B2≥G2 are satisfied.
 81. The multilayer electronic component of claim 56, wherein the body includes a 1-3 corner connecting the first surface to the third surface, a 1-4 corner connecting the first surface to the fourth surface, a 2-3 corner connecting the second surface to the third surface, and a 2-4 corner connecting the second surface to the fourth surface, wherein the 1-3 corner and the 2-3 corner have a form contracted in a direction of a center of the body taken in the first direction toward the third surface, and the 1-4 corner and the 2-4 corner have a form contracted in a direction of the center of the body taken in the first direction toward the fourth surface, and wherein the first external electrode includes a corner portion disposed on the 1-3 corner and the 2-3 corner, and the second external electrode includes a corner portion disposed on the 1-4 corner and the 2-4 corner. 82.-142. (canceled) 